Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma
    2.
    发明申请
    Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma 失效
    磁阻等离子体磁感应耦合等离子体反应器

    公开(公告)号:US20010004920A1

    公开(公告)日:2001-06-28

    申请号:US09773409

    申请日:2001-01-31

    CPC classification number: H01J37/3266 H01J37/321 H01J37/32834

    Abstract: The invention is embodied in a plasma reactor including a chamber enclosure having a process gas inlet and including a ceiling, a sidewall and a workpiece support pedestal capable of supporting a workpiece at a plasma processing location facing the ceiling, the workpiece processing location and ceiling defining a process region therebetween, the pedestal being spaced from said sidewall to define a pumping annulus therebetween having inner and outer walls, to permit process gas to be evacuated therethrough from the process region. The invention further includes a pair of opposing plasma confinement magnetic poles arranged adjacent the annulus within one of the inner and outer walls of the annulus, the opposing magnetic poles being axially displaced from one another the opposite poles being oriented to provide maximum magnetic flux in a direction across the annulus and a magnetic flux at the processing location less than the magnetic flux across the annulus.

    Abstract translation: 本发明体现在一种等离子体反应器中,该等离子体反应器包括具有工艺气体入口并具有天花板,侧壁和工件支撑基座的室外壳,其能够在面向天花板的等离子体处理位置处支撑工件,工件加工位置和天花板限定 其间的处理区域,所述基座与所述侧壁间隔开,以在其间限定具有内壁和外壁的泵送环形空间,以允许处理气体从处理区域排出。 本发明还包括一对相对的等离子体限制磁极,其邻近环形空间的内壁和外壁之一设置在环形空间附近,相对的磁极彼此轴向移位,相对的磁极被定向以在 穿过环带的方向和在处理位置处的磁通量小于穿过环空的磁通量。

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