Invention Application
US20010020194A1 Method and system for manufacturing semiconductor devices, and method and system for inspecting semiconductor devices 失效
用于制造半导体器件的方法和系统以及用于检查半导体器件的方法和系统

  • Patent Title: Method and system for manufacturing semiconductor devices, and method and system for inspecting semiconductor devices
  • Patent Title (中): 用于制造半导体器件的方法和系统以及用于检查半导体器件的方法和系统
  • Application No.: US09812822
    Application Date: 2001-03-21
  • Publication No.: US20010020194A1
    Publication Date: 2001-09-06
  • Inventor: Yuji TakagiHideaki DoiMakoto Ono
  • Applicant: Hitachi, Ltd.
  • Applicant Address: null
  • Assignee: Hitachi, Ltd.
  • Current Assignee: Hitachi, Ltd.
  • Current Assignee Address: null
  • Priority: JPP5-334606 19931228
  • Main IPC: G05B013/02
  • IPC: G05B013/02 G06F019/00 G01N037/00
Method and system for manufacturing semiconductor devices, and method and system for inspecting semiconductor devices
Abstract:
The present invention relates to a method of inspecting a product, comprising extracting defects from the product, classifying the defects on the basis of information about the extracted defects representing the analogy of the defects, extracting the feature data of the defects on the basis of the result of defect classification, and feeding back the feature data of the extracted defects for inspection; and to an inspection system comprising an inspecting means for extracting defects from the product, a defect classifying means for classifying the defects on the basis of information about the defects extracted by the inspecting means representing the analogy of the defects, and a feature data extracting means for extracting the feature data of the defects on the basis of the result of defect classification provided by the defect classifying means, characterized in that the feature data of the defects extracted by the feature data extracting means is fed back to the inspecting means for inspecting the product. The present invention relates also to a method of manufacturing a semiconductor device or the like, comprising extracting defects from the semiconductor device or the like, classifying the defects on the basis of information about the extracted defects representing the analogy of the defects, extracting the feature data of the defects on the basis of the result of defect classification, and feeding back the feature data of the extracted defects to an apparatus for manufacturing the semiconductor device or the like.
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