Invention Application
US20010055558A1 Alumina particles, production process thereof, composition comprising the particles and alumina slurry for polishing
审中-公开
氧化铝颗粒，其制备方法，包含颗粒的组合物和用于抛光的氧化铝浆料
- Patent Title: Alumina particles, production process thereof, composition comprising the particles and alumina slurry for polishing
- Patent Title (中): 氧化铝颗粒，其制备方法，包含颗粒的组合物和用于抛光的氧化铝浆料
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Application No.: US09891456Application Date: 2001-06-27
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Publication No.: US20010055558A1Publication Date: 2001-12-27
- Inventor: Hisao Kogoi , Jun Tanaka , Hayato Yamaya
- Applicant: SHOWA DENKO K.K.
- Applicant Address: null
- Assignee: SHOWA DENKO K.K.
- Current Assignee: SHOWA DENKO K.K.
- Current Assignee Address: null
- Priority: JPHEI.11-369555 19991227
- Main IPC: C01F007/02
- IPC: C01F007/02 ; C01F007/20
Abstract:
Alumina particles obtained from aluminum chloride by a gas phase method, the particles being amorphous or transition alumina particles and having an amorphous, null-, null- or null-crystalline form or a mixed form thereof, with primary particles thereof having an average particle diameter of 5 to 100 nm, and secondary particles, resulting from the aggregation of primary particles, having an average particle diameter of 50 to 800 nm.
Information query
