Invention Application
- Patent Title: Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method
- Patent Title (中): 电子光学系统，带电粒子束曝光装置及其制造方法
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Application No.: US09819907Application Date: 2001-03-29
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Publication No.: US20020000766A1Publication Date: 2002-01-03
- Inventor: Haruhito Ono , Takayuki Yagi
- Priority: JP2000-097125 20000331
- Main IPC: H01J001/53
- IPC: H01J001/53
Abstract:
An electron optical system of this invention includes, e.g., an upper electrode having a plurality of apertures, a plurality of middle electrodes having a plurality of aligned apertures, a lower electrode having a plurality of apertures, and a shield interposed between adjacent middle electrodes.
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