Invention Application
- Patent Title: Method of forming a fine pattern
- Patent Title (中): 形成精细图案的方法
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Application No.: US09938499Application Date: 2001-08-27
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Publication No.: US20020042203A1Publication Date: 2002-04-11
- Inventor: Ryuzo Ohmukai
- Applicant: Communications Research Lab., Indep. Admin. Inst.
- Applicant Address: JP Koganei-shi
- Assignee: Communications Research Lab., Indep. Admin. Inst.
- Current Assignee: Communications Research Lab., Indep. Admin. Inst.
- Current Assignee Address: JP Koganei-shi
- Priority: JP2000-256315 20000826
- Main IPC: H01L021/302
- IPC: H01L021/302 ; H01L021/461

Abstract:
The surface of a substrate having a transmission index is irradiated with a beam of atoms having a slow enough velocity to be adsorbed on the substrate. A laser beam whose frequency is detuned by 1 to 10 gigahertz from the resonant frequency of the atoms is projected onto the substrate at an angle, producing total reflection. The atom beam is reflected at regions at which an intensity of an evanescent wave emitted at this time from the substrate surface is high, and adsorbed at regions where the intensity is low, thereby achieving atomic fabrication patterns on a substrate. By using a hologram image to create the pattern, it is possible to form an atomic fabrication patterns in which the size of features correspond to the diameter of the laser beam, enabling the size to be reduced to the diffraction limit of the laser light.
Public/Granted literature
- US06686290B2 Method of forming a fine pattern Public/Granted day:2004-02-03
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