公开(公告)号：US20020042203A1

公开(公告)日：2002-04-11

申请号：US09938499

申请日：2001-08-27

Applicant: Communications Research Lab., Indep. Admin. Inst.

Inventor： Ryuzo Ohmukai

IPC: H01L021/302 ,  H01L021/461

CPC classification number: C23C14/048

Abstract: The surface of a substrate having a transmission index is irradiated with a beam of atoms having a slow enough velocity to be adsorbed on the substrate. A laser beam whose frequency is detuned by 1 to 10 gigahertz from the resonant frequency of the atoms is projected onto the substrate at an angle, producing total reflection. The atom beam is reflected at regions at which an intensity of an evanescent wave emitted at this time from the substrate surface is high, and adsorbed at regions where the intensity is low, thereby achieving atomic fabrication patterns on a substrate. By using a hologram image to create the pattern, it is possible to form an atomic fabrication patterns in which the size of features correspond to the diameter of the laser beam, enabling the size to be reduced to the diffraction limit of the laser light.

Abstract translation: 用具有足够慢的原子的光束照射具有透射率的基板的表面以吸附在基板上。 其频率与原子的共振频率失谐1至10千兆赫兹的激光束以一定角度投影到基板上，产生全反射。 原子光束在此处从衬底表面发射的ev逝波的强度高的区域反射，并且在强度低的区域被吸附，从而在衬底上实现原子制造图案。 通过使用全息图图像来产生图案，可以形成其中特征尺寸对应于激光束的直径的原子制造图案，使得能够将尺寸减小到激光的衍射极限。