Invention Application
- Patent Title: Photosensitive composition and photosensitive lithographic printing plate
- Patent Title (中): 感光组合物和感光平版印刷版
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Application No.: US09839906Application Date: 2001-04-20
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Publication No.: US20020048721A1Publication Date: 2002-04-25
- Inventor: Masamichi Kamiya , Koji Hayashi , Hirotaka Komine , Miyuki Makino
- Applicant: Kodak Polychrome Graphics L.L.C.
- Applicant Address: null
- Assignee: Kodak Polychrome Graphics L.L.C.
- Current Assignee: Kodak Polychrome Graphics L.L.C.
- Current Assignee Address: null
- Priority: JPP2000-132808 20000105
- Main IPC: G03F007/004
- IPC: G03F007/004

Abstract:
The present invention provides a photosensitive lithographic printing plate which displays superior ink receptivity and superior film strength of the photosensitive layer (image area). The photosensitive lithographic printing plate is produced by providing, on top of a support, a photosensitive composition comprising a fluororesin having a fluoro aliphatic group of 3 to 20 carbon atoms in which at least two of three terminal hydrogen atoms are substituted for fluorine atoms, and an ethylene based unsaturated group, as well as a negative photosensitive compound.
Public/Granted literature
- US06689539B2 Photosensitive composition and photosensitive lithographic printing plate Public/Granted day:2004-02-10
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