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    Photosensitive resin composition for color filters
    2.
    发明申请
    Photosensitive resin composition for color filters 有权
    用于滤色片的感光树脂组合物

    公开(公告)号：US20040191671A1

    公开(公告)日：2004-09-30

    申请号：US10732401

    申请日：2003-12-11

    发明人： Po-Yi Hsu

    IPC分类号： G03C001/73 ,  G03F007/004

    CPC分类号： G03F7/0007 ,  G03F7/033 ,  Y10S430/106 ,  Y10S430/111

    摘要： A photosensitive resin composition for color filters comprises (A) an alkali-soluble resin; (B) a photopolymerizable monomer; (C) a photoinitiator; (D) an organic solvent; and (E) a pigment; wherein said alkali-soluble resin (A) is formed by polymerizing at least one monomer (a-1), which dipole moment is below 1.5D and having at least one aromatic functional group and at least one copolymerizable monomer (a-2) other than said monomer (a-1), wherein the content of oligomer having a molecular weight below 1,000 of said alkali-soluble resin (A) is less than 0.6 wt %, based on the photosensitive resin composition except solvent(D), which remains less residue on an unexposed portion(s) of the substrate and the black matrix at the time of development, and provides color pixels having excellent heat resistance and chemical resistance, further provides LCD having lower electric resistance of the ITO electrode.

    摘要翻译： 用于滤色器的感光性树脂组合物包括（A）碱溶性树脂; （B）可光聚合单体; （C）光引发剂; （D）有机溶剂; 和（E）颜料; 其中所述碱溶性树脂（A）通过使至少一种偶极矩低于1.5D并具有至少一个芳族官能团和至少一种可共聚单体（a-2）的单体（a-1）聚合而形成 除了所述单体（a-1）以外，基于除了溶剂（D）以外的感光性树脂组合物，所述碱溶性树脂（A）的分子量低于1000的低聚物的含量小于0.6重量％ 在显影时，在基板和黑矩阵的未曝光部分上的残留少，并且提供具有优异的耐热性和耐化学性的彩色像素，还提供具有较低ITO电极电阻的LCD。

    Printing plate material and image formation method employing the same
    4.
    发明申请
    Printing plate material and image formation method employing the same 失效
    印版材料及其形成方法

    公开(公告)号：US20040157150A1

    公开(公告)日：2004-08-12

    申请号：US10669076

    申请日：2003-09-22

    申请人： KONICA CORPORATIOIN

    发明人： Takahiro Mori

    IPC分类号： G03F007/11 ,  G03F007/004 ,  G03F007/20 ,  G03F007/26

    CPC分类号： B41C1/1016 ,  B41C1/1025 ,  B41C2201/02 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/20 ,  B41C2210/24 ,  Y10S430/145 ,  Y10S430/146

    摘要： Disclosed are a printing plate material comprising a substrate and provided thereon, a component layer comprising a hydrophilic layer and an image formation layer, the hydrophilic layer being provided closer to the substrate than the image formation layer, wherein the hydrophilic layer contains an electron providing dye precursor, the image formation layer contains an organic electron accepting developing agent, and the component layer contains a light heat conversion material.

    摘要翻译： 公开了一种印刷板材料，其包括基板，其上设置有包括亲水层和图像形成层的成分层，所述亲水层比图像形成层更靠近基板设置，其中所述亲水层包含电子提供染料 前体，图像形成层含有有机电子接受显影剂，成分层含有轻热转换材料。

    Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective film
    6.
    发明申请
    Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective film 有权
    有机硅氧烷聚合物，光固化树脂组合物，图案化工艺和基材保护膜

    公开(公告)号：US20040142276A1

    公开(公告)日：2004-07-22

    申请号：US10752513

    申请日：2004-01-08

    发明人： Kazuhiro Arai ,  Hideto Kato ,  Satoshi Asai

    IPC分类号： G03F007/004 ,  G03F007/30 ,  C08F230/08

    CPC分类号： G03F7/0757 ,  C08F230/08 ,  C08F290/068 ,  G03F7/038

    摘要： A novel organosiloxane polymer is obtained by addition reaction of an organohydrogenpolysiloxane, an alkenyl-containing organopolysiloxane and an unsaturated compound of formula (3) or (4). Using the organosiloxane polymer, a photo-curable resin composition is prepared which can be exposed to radiation having a wide range of wavelength and developed to form a pattern. 1

    摘要翻译： 通过有机氢聚硅氧烷，含链烯基的有机聚硅氧烷和式（3）或（4）的不饱和化合物的加成反应获得新的有机硅氧烷聚合物。 使用有机硅氧烷聚合物，制备可暴露于宽波长范围的辐射并显影以形成图案的光固化树脂组合物。

    Photodefinable polymers for semiconductor applications
    7.
    发明申请
    Photodefinable polymers for semiconductor applications 审中-公开
    用于半导体应用的可光缩合聚合物

    公开(公告)号：US20040131970A1

    公开(公告)日：2004-07-08

    申请号：US10337575

    申请日：2003-01-07

    发明人： Robert P. Meagley ,  Michael D. Goodner

    IPC分类号： G03F007/004

    CPC分类号： G03F7/0047

    摘要： A polymer system for semiconductor applications may be formed by blending a filler material and a precursor for a photodefinable polymer. The filler may be chosen so as not to adversely affect the photodefinability of the resulting system and, in some embodiments, may improve the mechanical or chemical properties of the resulting system.

    摘要翻译： 用于半导体应用的聚合物体系可以通过混合填充材料和光可定义聚合物的前体来形成。 填料可以选择成不会不利地影响所得体系的光定性，并且在一些实施方案中可以改善所得体系的机械或化学性质。

    Photosensitive resin compositon, photosesitive resist for color filter, and process for producing color filter
    8.
    发明申请
    Photosensitive resin compositon, photosesitive resist for color filter, and process for producing color filter 审中-公开
    光敏树脂组合物，彩色滤光片的光敏抗蚀剂，以及生产滤色片的工艺

    公开(公告)号：US20040096757A1

    公开(公告)日：2004-05-20

    申请号：US10471751

    申请日：2003-09-25

    发明人： Hiroyuki Tokuda ,  Yasunobu Hirota ,  Hidenobu Ishikawa

    IPC分类号： G03F007/40 ,  G03F007/033 ,  G03F007/004 ,  G03F007/075 ,  C08F002/48 ,  C08L033/14

    CPC分类号： G03F7/0007 ,  G02B5/223 ,  G03F7/033

    摘要： An object of the present invention is to provide a photosensitive resin composition or a photosensitive resist for color filters which is superior in heat resistance, water resistance, solvent resistance, chemical resistance, and also transparency, and a method for producing color filters using them. The present invention relates to a photosensitive resin composition comprising a vinyl polymer (A) having at least one cyclocarbonate group and at least one carboxyl group in the molecule and a compound (B) having at least two ethylenically unsaturated double bonds in the molecule as a main component, which can introduce crosslinked structures by photocuring and thermosetting, a photosensitive resist for color filters comprising the photosensitive resin composition and a colorant, and a method for producing a color filter, using the photosensitive resist for color filters.

    摘要翻译： 本发明的目的是提供耐热性，耐水性，耐溶剂性，耐化学性和透明性都优异的用于滤色器的感光性树脂组合物或感光性抗蚀剂，以及使用它们的滤色器的制造方法。 本发明涉及一种感光性树脂组合物，其包含在分子中具有至少一个环碳酸酯基和至少一个羧基的乙烯基聚合物（A）和分子中具有至少两个烯属不饱和双键的化合物（B），作为 可通过光固化和热固化引入交联结构的主要成分，包含感光性树脂组合物和着色剂的滤色片用感光性抗蚀剂，以及使用该滤色片用感光性抗蚀剂的彩色滤光片的制造方法。

    Stripping method
    9.
    发明申请
    Stripping method 失效
    剥线方法

    公开(公告)号：US20040076910A1

    公开(公告)日：2004-04-22

    申请号：US10408044

    申请日：2003-04-05

    申请人： Shipley Company, L.L.C.

    发明人： Edward W. Rutter JR. ,  Cuong Manh Tran ,  Edward C. Orr

    IPC分类号： G03F007/004 ,  G03F007/00

    CPC分类号： G03F7/422 ,  G03F7/426

    摘要： Compositions and methods for the removal of patterned photodefinable materials, such as photoresists and/or photoimageable dielectric materials, from substrates are provided. Such compositions and methods are useful in the manufacture of electronic devices. Methods of reworking electronic device substrates by removing patterned photodefinable material from an underlying organic film are also provided.

    摘要翻译： 提供了用于从衬底去除图案化的光致定影材料（例如光刻胶和/或可光成像的电介质材料）的组合物和方法。 这样的组合物和方法在电子设备的制造中是有用的。 还提供了通过从下面的有机膜去除图案化的光可定义材料来重新加工电子器件衬底的方法。

    Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same
    10.
    发明申请
    Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same 有权
    具有腈和脂环族离去基团的共聚物和包含它们的光致抗蚀剂组合物

    公开(公告)号：US20040076906A1

    公开(公告)日：2004-04-22

    申请号：US10683532

    申请日：2003-10-10

    申请人： Shipley Company, L.L.C.

    发明人： George G. Barclay ,  Zhibiao Mao ,  Robert J. Kavanagh

    IPC分类号： G03F007/004 ,  G03F007/039

    CPC分类号： G03F7/039 ,  C07C69/54 ,  C07C2602/42 ,  C08F220/18 ,  C08F220/44 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    摘要： The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention contain in specified molar ratios both nitrile and photoacid labile groups that have an alicyclic moiety, particularly a bridged bicyclic or tricyclic group or other caged group. Polymers and resists of the invention can exhibit substantial resistance to plasma etchants.

    摘要翻译： 本发明包括聚合物和光致抗蚀剂组合物，其包含聚合物作为树脂粘合剂组分。 本发明的光刻胶包括可以在短波长例如亚200nm，特别是193nm下有效成像的化学放大的正性抗蚀剂。 本发明的聚合物以特定的摩尔比含有具有脂环部分的腈和光致酸不稳定基团，特别是桥连的双环或三环基团或其它笼状基团。 本发明的聚合物和抗蚀剂可显示出对等离子体蚀刻剂的实质性阻力。