Invention Application
- Patent Title: Photolithographically-patterned variable capacitor structures and method of making
- Patent Title (中): 光刻图案可变电容器结构及其制造方法
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Application No.: US09975358Application Date: 2001-10-11
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Publication No.: US20020080554A1Publication Date: 2002-06-27
- Inventor: Christopher L. Chua , Eric Peeters , Koenraad F. Schuylenbergh , Donald L. Smith
- Applicant: Xerox Corporation.
- Applicant Address: null
- Assignee: Xerox Corporation.
- Current Assignee: Xerox Corporation.
- Current Assignee Address: null
- Main IPC: H01G004/35
- IPC: H01G004/35

Abstract:
A new type of high-Q variable capacitor includes a substrate, a first electrically conductive layer fixed to the substrate, a dielectric layer fixed to a portion of the electrically conductive layer, and a second electrically conductive layer having an anchor portion and a free portion. The anchor portion is fixed to the dielectric layer and the free portion is initially fixed to the dielectric layer, but is released from the dielectric layer to become separated from the dielectric layer, and wherein an inherent stress profile in the second electrically conductive layer biases the free portion away from the a dielectric layer. When a bias voltage is applied between the first electrically conductive layer and the second electrically conductive layer, electrostatic forces in the free portion bend the free portion towards the first electrically conductive layer, thereby increasing the capacitance of the capacitor.
Public/Granted literature
- US06922327B2 Photolithographically-patterned variable capacitor structures and method of making Public/Granted day:2005-07-26
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