发明申请
- 专利标题: Semiconductor device
- 专利标题(中): 半导体器件
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申请号: US09880124申请日: 2001-06-14
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公开(公告)号: US20020084489A1公开(公告)日: 2002-07-04
- 发明人: Fumitoshi Yamamoto
- 申请人: Mitsubishi Denki Kabushiki Kaisha
- 申请人地址: null
- 专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址: null
- 优先权: JP2000-401384 20001228
- 主分类号: H01L027/12
- IPC分类号: H01L027/12
摘要:
An npn transistor allowing the potential of each terminal to be easily set and superior in characteristics such as withstand-voltage performance and current amplification factor can be obtained. An n-type buried layer on a p-type substrate, a p-type buried layer on the n-type buried layer, n-type epitaxial layers covering the above layers, terminal regions on the surfaces of the layers, p-type outer-periphery layers encircling the terminal regions, and an encirclement layer encircling the layers are included, and p-type base regions and the p-type outer-periphery layer are continued to the p-type buried layer to separate a collector region from a p-type substrate and the n-type buried layer and the n-type encirclement layer are continued to separate the p-type buried layer, the p-type base region, and the p-type outer-periphery layer from the p-type substrate.
公开/授权文献
- US06593629B2 Semiconductor device 公开/授权日:2003-07-15
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