Invention Application
- Patent Title: Scanning electronic beam apparatus
- Patent Title (中): 扫描电子束装置
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Application No.: US10021332Application Date: 2001-10-29
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Publication No.: US20020088941A1Publication Date: 2002-07-11
- Inventor: Akira Yonezawa
- Priority: JP2000-340583 20001108; JP2001-175690 20010611; JP2001-313665 20011011
- Main IPC: H01J037/28
- IPC: H01J037/28

Abstract:
The secondary electrons, from a sample placed within a lens magnetic field, are detected by a plurality of secondary electron detectors, thereby effectively observing a concave/convex in a sample surface. In a scanning electronic beam apparatus having upper and lower electrodes built in a single-pole magnetic-field type lens to place a sample within a lens magnetic field, a negative voltage is applied to the sample and the lower electrode opposed thereto while a zero or positive voltage is applied to the upper electrode, whereby an electric field for suppressing the helical motion of a secondary electron given off from the sample due to electron-beam irradiation is caused within a region of from the sample to an objective lens magnetic field space closer to an electron source. The secondary electron is detected by a division-type MCP or a plurality of scintillator-type secondary electron detectors arranged sandwiching the optical axis.
Public/Granted literature
- US06617579B2 Scanning electronic beam apparatus Public/Granted day:2003-09-09
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