Invention Application
US20020094064A1 Large-area individually addressable multi-beam x-ray system and method of forming same 有权
大面积单独寻址多光束x射线系统及其形成方法

  • Patent Title: Large-area individually addressable multi-beam x-ray system and method of forming same
  • Patent Title (中): 大面积单独寻址多光束x射线系统及其形成方法
  • Application No.: US10051183
    Application Date: 2002-01-22
  • Publication No.: US20020094064A1
    Publication Date: 2002-07-18
  • Inventor: Otto Z. ZhouJianping LuQi Qiu
  • Main IPC: H01J035/00
  • IPC: H01J035/00 H01J035/22 H01J035/32
Large-area individually addressable multi-beam x-ray system and method of forming same
Abstract:
A structure to generate x-rays has a plurality of stationary and individually electrically addressable field emissive electron sources with a substrate composed of a field emissive material, such as carbon nanotubes. Electrically switching the field emissive electron sources at a predetermined frequency field emits electrons in a programmable sequence toward an incidence point on a target. The generated x-rays correspond in frequency and in position to that of the field emissive electron source. The large-area target and array or matrix of emitters can image objects from different positions and/or angles without moving the object or the structure and can produce a three dimensional image. The x-ray system is suitable for a variety of applications including industrial inspection/quality control, analytical instrumentation, security systems such as airport security inspection systems, and medical imaging, such as computed tomography.
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