Invention Application
US20020127875A1 Point of use mixing and aging system for chemicals used in a film forming apparatus
审中-公开
使用在成膜设备中使用的化学品的使用点混合和老化系统
- Patent Title: Point of use mixing and aging system for chemicals used in a film forming apparatus
- Patent Title (中): 使用在成膜设备中使用的化学品的使用点混合和老化系统
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Application No.: US10092980Application Date: 2002-03-06
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Publication No.: US20020127875A1Publication Date: 2002-09-12
- Inventor: Timothy Weidman , Eric (Bram) Britcher , Todd Balisky
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L021/31
- IPC: H01L021/31 ; H01L021/469 ; B05C003/00 ; B05C019/02
Abstract:
A method for forming a low k dielectric constant material over a substrate. According to one embodiment, the method includes combining, in a mixing apparatus fluidly coupled to a solution applicator, an organo silicate glass (OSG) precursor, a solvent and a surfactant with water and an acid catalyst to form a coating solution; aging the coating solution in the mixing apparatus to form an aged coating solution; transporting the aged coating solution to the solution applicator; and then applying the aged coating solution to the substrate with the applicator.
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