Invention Application
US20020144725A1 Semiconductor structure suitable for forming a solar cell, device including the structure, and methods of forming the device and structure 审中-公开
适用于形成太阳能电池的半导体结构,包括该结构的器件,以及形成器件和结构的方法

  • Patent Title: Semiconductor structure suitable for forming a solar cell, device including the structure, and methods of forming the device and structure
  • Patent Title (中): 适用于形成太阳能电池的半导体结构,包括该结构的器件,以及形成器件和结构的方法
  • Application No.: US09832354
    Application Date: 2001-04-10
  • Publication No.: US20020144725A1
    Publication Date: 2002-10-10
  • Inventor: Dirk C. JordanBarbara Foley BarenburgRavindranath Droopad
  • Applicant: Motorola, Inc.
  • Applicant Address: null
  • Assignee: Motorola, Inc.
  • Current Assignee: Motorola, Inc.
  • Current Assignee Address: null
  • Main IPC: H01L031/00
  • IPC: H01L031/00
Semiconductor structure suitable for forming a solar cell, device including the structure, and methods of forming the device and structure
Abstract:
Solar cell structures (100) including high quality epitaxial layers of monocrystalline semiconductor materials that are grown overlying monocrystalline substrates (102) such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers are disclosed. One way to achieve the formation of a compliant substrate includes first growing an accommodating buffer layer (104) on a silicon wafer. The accommodating buffer (104) layer is a layer of monocrystalline material spaced apart from the silicon wafer by an amorphous interface layer (112) of silicon oxide. The amorphous interface layer (112) dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The solar cell structures also include a dye (110) to increase an efficiency of the solar cell.
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