发明申请
US20020160303A1 Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same
失效
具有多环结构的醚单体和聚合物，以及由其获得的光敏聚合物和抗蚀剂组合物
- 专利标题： Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same
- 专利标题（中）： 具有多环结构的醚单体和聚合物，以及由其获得的光敏聚合物和抗蚀剂组合物
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申请号： US10132804申请日： 2002-04-24
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公开(公告)号： US20020160303A1公开(公告)日： 2002-10-31
- 发明人: Hyun-Woo Kim , Sang-Gyun Woo , Sung-Ho Lee
- 申请人： Samsung Electronics Co., Ltd.
- 申请人地址： KR Suwon-city
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR Suwon-city
- 优先权： KR01-22356 20010425
- 主分类号： G03F007/039
- IPC分类号： G03F007/039 ; C08F034/02 ; C07D311/78
摘要：
Provided are alkenyl ether-based monomers having multi-ring structure, and photosensitive polymers and resist compositions obtained from the same. The photosensitive polymer includes a monomer unit represented by the following formula: 1 wherein R4 and R5 are independently -H or -CH3, and R4 are independently -H, -OH or a alkyl group having 1-20 carbon atoms.
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