Invention Application
- Patent Title: Method of illuminating a layer of a material, in particular of photosensitive resin
- Patent Title (中): 照射材料层,特别是光敏树脂层的方法
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Application No.: US10114428Application Date: 2002-04-02
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Publication No.: US20020187435A1Publication Date: 2002-12-12
- Inventor: Serdar Manakli , Yorick Trouillet
- Applicant: STMICROELECTRONICS S.A.
- Applicant Address: FR MONTROUGE
- Assignee: STMICROELECTRONICS S.A.
- Current Assignee: STMICROELECTRONICS S.A.
- Current Assignee Address: FR MONTROUGE
- Priority: FR0104514 20010403
- Main IPC: G03F007/20
- IPC: G03F007/20

Abstract:
A method of illuminating a layer of a material, in particular a photosensitive resin, using a light source, in order to expose an area of that material to a useful dose of light for subsequent etching of that material in that area, consisting in effecting a first exposure through a pattern of a first mask made up of a central hole and peripheral holes with a first dose of light less than said useful dose, and a second exposure through a pattern of a second mask made up of a single hole with a second dose of light such that the cumulative total of said first dose induced through the central hole of the first mask and the second dose induced through the single hole of said second mask produces at least said useful dose over said area.
Information query