发明申请
US20030081213A1 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices
有权
对准装置,使用其的曝光装置以及制造装置的方法
- 专利标题: Alignment apparatus, exposure apparatus using same, and method of manufacturing devices
- 专利标题(中): 对准装置,使用其的曝光装置以及制造装置的方法
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申请号: US10279924申请日: 2002-10-25
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公开(公告)号: US20030081213A1公开(公告)日: 2003-05-01
- 发明人: Satoru Oishi , Hideki Ina , Takehiko Suzuki , Koichi Sentoku
- 申请人: Canon Kabushiki Kaisha
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 优先权: JP2001-333347 20011030
- 主分类号: G01B011/00
- IPC分类号: G01B011/00
摘要:
An alignment apparatus for aligning a reflective reticle includes a light source for emitting alignment light; an optical unit for guiding the alignment light, which has been emitted by the light source, to an alignment mark provided on the reticle and a reference mark provided on a reticle stage that holds the reticle; and detecting unit for detecting the alignment light reflected from the alignment mark and the reference mark, wherein the reticle is aligned on the basis of the result of detection by the detection unit.
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