发明申请
US20030087751A1 Ceramic member for semiconductor manufacturing equipment 有权
半导体制造设备用陶瓷件

  • 专利标题: Ceramic member for semiconductor manufacturing equipment
  • 专利标题(中): 半导体制造设备用陶瓷件
  • 申请号: US10263460
    申请日: 2002-10-02
  • 公开(公告)号: US20030087751A1
    公开(公告)日: 2003-05-08
  • 发明人: Toshiyuki HamadaMasahiro Nakahara
  • 优先权: JP2001-307778 20011003
  • 主分类号: C04B035/10
  • IPC分类号: C04B035/10 C04B035/505
Ceramic member for semiconductor manufacturing equipment
摘要:
There is provided a ceramic member for semiconductor manufacturing equipment which is formed of an alumina-based sinter containing an yttrium-aluminum-garnet at the amount of 3 to 50 wt %, silicon oxide at the amount of not more than 0.2 wt %, preferably 0.1 wt %, and the balance substantially alumina, wherein the sinter has dielectric loss of not more than 4null10null4 particularly 2.5null10null4 or less in the frequency range of 10 MHz to 5 GHz. Such a member may be formed of a ceramic sinter including an aluminum phase having mean crystal grain size in a range of 2 to 10 nullm and a yttrium-aluminum-garnet phase having a mean crystal grain size in a range of 1.5 to 5 nullm, wherein the ratio of the mean crystal grain size of the alumina phase to that of the yttrium-aluminum-garnet phase is larger than 1 and smaller than 7.
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