发明申请
US20030090643A1 Light source, light source generation control method, exposure apparatus and maintenance method therefor, and semiconductor device manufacturing method and semiconductor production facility 失效
光源,光源发生控制方法,曝光装置及其维护方法以及半导体器件制造方法和半导体制造设备

  • 专利标题: Light source, light source generation control method, exposure apparatus and maintenance method therefor, and semiconductor device manufacturing method and semiconductor production facility
  • 专利标题(中): 光源,光源发生控制方法,曝光装置及其维护方法以及半导体器件制造方法和半导体制造设备
  • 申请号: US10286813
    申请日: 2002-11-04
  • 公开(公告)号: US20030090643A1
    公开(公告)日: 2003-05-15
  • 发明人: Mitsuya Sato
  • 申请人: Canon Kabushiki Kaisha
  • 申请人地址: JP Tokyo
  • 专利权人: Canon Kabushiki Kaisha
  • 当前专利权人: Canon Kabushiki Kaisha
  • 当前专利权人地址: JP Tokyo
  • 优先权: JP2001-347473 20011113
  • 主分类号: G03B027/72
  • IPC分类号: G03B027/72
Light source, light source generation control method, exposure apparatus and maintenance method therefor, and semiconductor device manufacturing method and semiconductor production facility
摘要:
In a step S1, an excimer laser control unit sets a central wavelength command value, an integral spectrum distribution command value, and an exposure pulse number in a laser internal control unit. In a step S2, the laser internal control unit receives the central wavelength command value, the integral spectrum distribution command value, and the exposure pulse number from the excimer control unit, and executes an actual exposure when an exposure command is received. In a step S3, the laser internal control unit, after executing exposure, measures the central wavelength of the pulse and the spectral distribution, and corrects any discrepancy between the actually measured central wavelength and the central wavelength command value by outputting a drive command to the narrow-band module so that the central wavelength of the succeeding pulse substantially matches the central wavelength command value. In a step S4, spectral distribution data is integrated with each exposure.
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