公开(公告)号：US20040179191A1

公开(公告)日：2004-09-16

申请号：US10812095

申请日：2004-03-30

申请人： Seiko Epson Corporation

发明人： Masashi Kitabayashi ,  Koichi Kojima ,  Shunji Umemura

IPC分类号： G03B027/72 ,  G01B009/00

CPC分类号： G01M11/0264 ,  G01M11/0242

摘要： A lens evaluation method for calculating resolution evaluation value based on a detected luminance value in order to evaluate resolution of lens has a background luminance value acquiring step for acquiring a luminance value at a background part having no test pattern formed thereon, a maximum luminance value acquiring step for acquiring maximum luminance value in the test pattern image, a minimum luminance value acquiring step for acquiring minimum luminance value and an evaluation value calculating step for calculating a resolution evaluation value based on the luminance values obtained in the respective steps.

公开(公告)号：US20040174612A1

公开(公告)日：2004-09-09

申请号：US10786134

申请日：2004-02-26

申请人： OLYMPUS CORPORATION

发明人： Yoshimasa Suzuki ,  Tetsuhide Takeyama

IPC分类号： G03B027/72 ,  G02B015/14

CPC分类号： G02B15/163

摘要： An imaging optical system has a variable magnification optical system. The variable magnification optical system includes, in order from the object side, a first lens unit with positive refractive power, a second lens unit with positive refractive power, a third lens unit with negative refractive power, a fourth lens unit with positive refractive power, and an aperture stop interposed between the third lens unit and the fourth lens unit. The variable magnification optical system changes an imaging magnification while keeping an object-to-image distance constant. The imaging magnification is changed by varying spacing between the first lens unit and the second lens unit, spacing between the second lens unit and the third lens unit, and spacing between the third lens unit and the fourth lens unit. When the imaging magnification is changed, the imaging optical system satisfies the following conditions in at least one variable magnification state: nullEnnull/L>0.4 nullEx/nullL/nullnull>0.4 where En is a distance from a first lens surface on the object side of the variable magnification optical system to the entrance pupil of the imaging optical system, L is the object-to-image distance of the imaging optical system, Ex is a distance from the most image-side lens surface of the variable magnification optical system to the exit pupil of the imaging optical system, and null is the magnification of the entire system of the imaging optical system.

摘要翻译： 成像光学系统具有可变放大率光学系统。 可变放大率光学系统从物体侧依次包括具有正屈光力的第一透镜单元，具有正屈光力的第二透镜单元，具有负屈光力的第三透镜单元，具有正屈光力的第四透镜单元， 以及插入在第三透镜单元和第四透镜单元之间的孔径光阑。 可变放大倍率光学系统在保持对象间距离保持恒定的同时改变成像倍率。 通过改变第一透镜单元和第二透镜单元之间的间隔，第二透镜单元和第三透镜单元之间的间隔以及第三透镜单元和第四透镜单元之间的间隔来改变成像倍率。 当成像倍率改变时，成像光学系统在至少一个可变放大状态下满足以下条件：| En | / L> 0.4 | Ex / | L /β|> 0.4其中En是距第一透镜表面的距离 在可变放大光学系统的物体侧到成像光学系统的入射光瞳，L是成像光学系统的物体到图像的距离，Ex是距离变量的最大像侧透镜表面的距离 放大光学系统到成像光学系统的出射光瞳，β是成像光学系统的整个系统的放大倍数。

公开(公告)号：US20040165171A1

公开(公告)日：2004-08-26

申请号：US10784438

申请日：2004-02-23

发明人： Duc Chinh Tran ,  Juergen Kleinschmidt

IPC分类号： G03B027/72

CPC分类号： G03F7/70983 ,  G03B27/72 ,  G03F7/70916

摘要： The invention is directed to an arrangement for debris reduction in a radiation source based on a plasma, particularly for generating bundled radiation in the extreme ultraviolet (EUV) spectral region. The object of the invention, to find a novel possibility for beam shaping and debris reduction in a radiation source based on a plasma which substantially increases the life of collector optics without having to tolerate a substantial reduction in transparency or a sudden destruction of the protective mechanism, is met according to the invention in that exchangeable additional optics are arranged in the radiation path between a conventional debris filter and the collector optics, wherein a distance-increasing intermediate imaging of the source location relative to the collector optics is provided by the additional optics for further debris reduction.

摘要翻译： 本发明涉及一种用于基于等离子体的辐射源中碎片减少的装置，特别是用于在极紫外（EUV）光谱区域中产生束缚辐射。 本发明的目的是为了在基于等离子体的辐射源中找到射束成形和碎屑减少的新颖可能性，其基本上延长了集光器光学元件的寿命，而不必忍受透明度的显着降低或保护机构的突然破坏 根据本发明，由于可更换附加光学器件布置在常规碎片滤波器和收集器光学器件之间的辐射路径中，其中源位置相对于收集器光学器件的距离增加中间成像由附加光学器件提供 进一步减少碎片。

公开(公告)号：US20030218734A1

公开(公告)日：2003-11-27

申请号：US10464554

申请日：2003-06-19

申请人： Nikon Corporation

发明人： Akihiro Goto

IPC分类号： G03B027/72

CPC分类号： G03F7/70583

摘要： The present invention aims to offer a compact illumination apparatus with a simple structure that can reduce an ununiformity of the Gaussian intensity distribution due to a laser beam and an interference noise due to an optical integrator at the same time. The present invention secondarily aims to offer a projection and exposure apparatus that uses said illumination apparatus and an exposing method. In order to eliminate disadvantages as described above, the present invention offers an illumination apparatus that illuminates a mask with a predetermined pattern formed characterized in that said apparatus comprises the following components: a light source that supplies a light beam; a multi-beam forming optical system that consists of a reflecting member and a light splitting member and converts said light beam from said light source into a group of multiple beams; an optical integrator that splits said light from said light source and forms multiple light source images. As for said multi-beam forming optical system, said light splitting member is provided at a predetermined angle with respect to said reflecting member; and forms a group of multiple beams by repeatedly reflecting said light beam from said light source between said reflecting member and said light splitting member.

摘要翻译： 本发明旨在提供一种结构简单的小型照明装置，其可以减少由于激光束引起的高斯强度分布的不均匀性和同时由于光学积分器引起的干扰噪声。 本发明的目的是提供一种使用所述照明装置和曝光方法的投影和曝光装置。 为了消除如上所述的缺点，本发明提供了一种以预定图案照亮掩模的照明装置，其特征在于所述装置包括以下部件：提供光束的光源; 多光束形成光学系统，其由反射构件和分光构件组成，并将来自所述光源的所述光束转换为多束光束; 光学积分器，其分离来自所述光源的所述光并形成多个光源图像。 对于所述多光束形成光学系统，所述分光构件相对于所述反射构件设置成预定角度; 并且通过在所述反射构件和所述分光构件之间重复地反射来自所述光源的所述光束而形成一组多个光束。

公开(公告)号：US20030218731A1

公开(公告)日：2003-11-27

申请号：US10442466

申请日：2003-05-20

发明人： Hiroyuki Tomita

IPC分类号： G03B027/32 ,  G03B027/42 ,  G03B027/54 ,  G03B027/72 ,  G03F007/20

CPC分类号： G03F7/7025 ,  G03B27/32

摘要： An optical stop unit includes plural light blocking plates, and a cam mechanism for driving the plural light blocking plates to vary an aperture diameter, the cam mechanism including a cam follower and a cam groove, wherein the cam follower and cam groove have mutually facing surfaces, through which the cam follower and cam groove contact each other, and at least one of which surfaces has a curved section that is substantially perpendicular to a plane formed by the plural light blocking plates.

摘要翻译： 光学停止单元包括多个遮光板和用于驱动多个遮光板以改变孔径的凸轮机构，所述凸轮机构包括凸轮从动件和凸轮槽，其中所述凸轮从动件和凸轮槽具有相互面对的表面 凸轮从动件和凸轮槽通过其彼此接触，并且其中至少一个表面具有基本上垂直于由多个遮光板形成的平面的弯曲部分。

公开(公告)号：US20030174303A1

公开(公告)日：2003-09-18

申请号：US10377947

申请日：2003-02-28

发明人： Patrick P. Naulleau

IPC分类号： G03B027/72

CPC分类号： G03F7/70091 ,  G03F7/702

摘要： Techniques for generating partially coherent radiation and particularly for converting effectively coherent radiation from a synchrotron to partially coherent EUV radiation suitable for projection lithography.

摘要翻译： 用于产生部分相干辐射的技术，特别是用于将来自同步加速器的有效相干辐射转换成适用于投影光刻的部分相干的EUV辐射。

公开(公告)号：US20030090643A1

公开(公告)日：2003-05-15

申请号：US10286813

申请日：2002-11-04

申请人： Canon Kabushiki Kaisha

发明人： Mitsuya Sato

IPC分类号： G03B027/72

CPC分类号： G03B27/72 ,  G03F7/70575

摘要： In a step S1, an excimer laser control unit sets a central wavelength command value, an integral spectrum distribution command value, and an exposure pulse number in a laser internal control unit. In a step S2, the laser internal control unit receives the central wavelength command value, the integral spectrum distribution command value, and the exposure pulse number from the excimer control unit, and executes an actual exposure when an exposure command is received. In a step S3, the laser internal control unit, after executing exposure, measures the central wavelength of the pulse and the spectral distribution, and corrects any discrepancy between the actually measured central wavelength and the central wavelength command value by outputting a drive command to the narrow-band module so that the central wavelength of the succeeding pulse substantially matches the central wavelength command value. In a step S4, spectral distribution data is integrated with each exposure.

摘要翻译： 在步骤S1中，准分子激光控制单元在激光内部控制单元中设定中心波长指令值，积分光谱分布指令值和曝光脉冲数。 在步骤S2中，激光内部控制单元从准分子控制单元接收中心波长指令值，积分光谱分布指令值和曝光脉冲数，并且在接收到曝光指令时执行实际曝光。 在步骤S3中，激光内部控制单元在执行曝光之后测量脉冲的中心波长和光谱分布，并通过向第三步骤输出驱动命令来校正实际测量的中心波长与中心波长指令值之间的差异 窄带模块，使得后续脉冲的中心波长基本上与中心波长指令值相匹配。 在步骤S4中，将光谱分布数据与每次曝光相结合。

公开(公告)号：US20030086070A1

公开(公告)日：2003-05-08

申请号：US10162601

申请日：2002-06-06

发明人： Doo-Hoon Goo ,  Jin-Jun Park

IPC分类号： G03B027/72

CPC分类号： G03F7/701 ,  G03F7/70108 ,  G03F7/70183

摘要： Methods and apparatus for varying the number and intensity of beams of a photo-lithographic light source for exposing photoresist material include beam dividers and beam focusing means. Methods include producing an incident light beam having uniform intensity distribution, refracting the incident light beam into a plurality of divergent beams, refracting the plurality of divergent beams into a plurality of parallel beams, and exposing an object with light of the plurality of parallel beams. Apparatus includes source of light beam having uniform intensity distribution, first refracting element for refracting the light beam into a plurality of divergent beams, second refracting element for refracting the plurality of divergent beams into a plurality of parallel beams, and means for exposing the object with light of the plurality of parallel beams. Variations in the separations of the refractive elements allows for the control of the size, shape, and dispersion patterns of resultant beams.

摘要翻译： 用于改变用于曝光光刻胶材料的光刻光源的光束的数量和强度的方法和装置包括分光器和光束聚焦装置。 方法包括产生具有均匀强度分布的入射光束，将入射光束折射成多个发散光束，将多个发散光束折射成多个平行光束，并用多个平行光束的光曝光物体。 设备包括具有均匀强度分布的光束源，用于将光束折射成多个发散光束的第一折射元件，用于将多个发散光束折射成多个平行光束的第二折射元件，以及用于将物体曝光 多个平行光束的光。 折射元件分离的变化允许控制合成光束的尺寸，形状和色散图案。

公开(公告)号：US20030035092A1

公开(公告)日：2003-02-20

申请号：US09931185

申请日：2001-08-15

发明人： Brian Bramlett ,  James Okuley

IPC分类号： G03B027/72

CPC分类号： F21V17/02 ,  F21W2131/406 ,  F21Y2115/10 ,  G02B7/1827 ,  G02B26/0816

摘要： A light projection apparatus comprising a plurality of light emitting diodes (LEDs) of two or three primary colors adapted to provide light along a light path common to said LEDs. The output color of the collective diodes is controlled by displaying the various colors at carefully controlled intensities, and the resulting colored light projected through a transmissive LCD matrix interposed within the light path resulting in a light pattern. A mirror positioned within but at an oblique angle to the light path reflects the light pattern in a direction dictated by the angle of the mirror to the light path where the angle axis is modified by a pair of worm drives affixed to transverse axes of the mirror mount.

摘要翻译： 一种光投射装置，包括适于沿着所述LED共同的光路提供光的两个或三个原色的多个发光二极管（LED）。 通过以谨慎控制的强度显示各种颜色来控制集体二极管的输出颜色，并且所产生的彩色光通过插入在光路内的透射型LCD矩阵投射，产生光图案。 位于光路内但与光路成倾斜角度的反射镜将反射镜的角度指示的光图案反射到光轴，其中角轴被固定到镜子的横轴的一对蜗杆驱动器改变 安装。

公开(公告)号：US20020149757A1

公开(公告)日：2002-10-17

申请号：US09826445

申请日：2001-04-04

申请人： Optical Switch Corporation

发明人： Adam F. Kelsey ,  Mark A. Leclerc ,  Bruce D. MacLeod

IPC分类号： G03B027/72

CPC分类号： G03F7/70566 ,  G03F7/70408

摘要： A polarization vector alignment technique for interference lithography generates a control signal indicating a difference in orientation between a polarization state of an emitted optical signal and a desired linear polarization vector. The technique adjusts the linear polarization vector to enhance the quality of the pattern produced for interference lithography.

摘要翻译： 用于干涉光刻的偏振矢量对准技术产生指示发射的光信号的极化状态和期望的线偏振矢量之间的取向差异的控制信号。 该技术调整线性极化矢量以增强干涉光刻产生的图案的质量。