发明申请
- 专利标题： ONIUM SALTS AND POSITIVE RESIST MATERIALS USING THE SAME
- 专利标题（中）： ONIUM SALTS和积极的材料使用它
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申请号： US08815410申请日： 1997-03-11
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公开(公告)号： US20030096189A1公开(公告)日： 2003-05-22
- 发明人: FUJIO YAGIHASHI , TOMOYOSHI FURIHATA , JUN WATANABE , AKINOBU TANAKA , YOSHIO KAWAI , TADAHITO MATSUA
- 优先权： JP41715/93 19930208; JP242101/93 19930902
- 主分类号： G03F007/038
- IPC分类号： G03F007/038
摘要：
Disclosed are novel onium salts represented by general formula (R) 3SnullM, wherein three R's may be the same or different, each being an aryl group, provided that at least one of R's is a t-alkoxy substituted phenyl group, and M is an anion capable of foxing the sulfonium salts; and high energy radiation-responsive positive resist materials using said novel onium salts as acid generator.
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