利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

410 条记录 (耗时 0.025 秒)

    Acrylic compounds for sub-200 nm photoresist compositions and methods for making and using same
    1.
    发明申请
    Acrylic compounds for sub-200 nm photoresist compositions and methods for making and using same 失效
    用于亚200nm光致抗蚀剂组合物的丙烯酸酯化合物及其制备和使用方法

    公开(公告)号：US20040175644A1

    公开(公告)日：2004-09-09

    申请号：US10371251

    申请日：2003-02-20

    发明人： Atteye Houssein Abdourazak ,  Thomas John Markley

    IPC分类号： G03F007/038

    CPC分类号： G03F7/0046 ,  C07D309/10 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/115

    摘要： Disclosed herein is an acrylic compound that can be polymerized by itself or with at least one other ethylenically unsaturated monomer to provide a polymer. The polymer may be used, for example, within a sub-200 nm photoresist composition. Also disclosed is a method to make the acrylic compound of the present invention from the raw material trifluoroacetone.

    摘要翻译： 本文公开了可以通过其本身或与至少一种其它烯属不饱和单体聚合以提供聚合物的丙烯酸化合物。 聚合物可以用于例如在200nm以下的光致抗蚀剂组合物中。 还公开了从原料三氟丙酮制备本发明的丙烯酸类化合物的方法。

    Positive working thermal imaging assembly or structure, method for the manufacture thereof and products used as lithographic printing plates and the like
    2.
    发明申请
    Positive working thermal imaging assembly or structure, method for the manufacture thereof and products used as lithographic printing plates and the like 失效
    正性工作热成像组件或结构，其制造方法和用作平版印刷版的产品等

    公开(公告)号：US20040152018A1

    公开(公告)日：2004-08-05

    申请号：US10726623

    申请日：2003-12-04

    发明人： Andre Luiz Arias ,  Luiz Nei Arias ,  Marjorie Arias ,  Mario Italo Provenzano

    IPC分类号： G03F007/038 ,  G03F007/095 ,  G03F007/16 ,  G03F007/14

    CPC分类号： C09D161/30 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/04 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/26 ,  B41C2210/262 ,  B41M5/368 ,  B41M5/465 ,  C09D161/06 ,  C09D161/24 ,  Y10S430/165

    摘要： The invention relates to Positive working thermal imaging assembly comprising: A) a substrate; and B) a thermally sensitive imaging element of a composite layer structure comprising: (i) a first layer on the substrate of a polymeric material soluble in aqueous alkali solution, optionally containing compounds that absorb and convert light to heat and/or a coloured dye or pigment; said first layer being converted at its surface by treatment with solutions at elevated temperatures that contain an active compound or compounds capable of rendering said first polymeric material insoluble to aqueous alkali developer at the point of contact ; the first layer being oleophilic; (ii) optionally, a first intermediate layer between the substrate and the said first layer with a second polymeric material which is soluble or dispersible in aqueous solution optionally containing compounds that absorb and convert light or radiation to heat and/or a coloured dye or pigment coated from a solvent that does not substantially dissolve the first layer; and (iii) optionally, a third or top layer over the converted first layer and composed of a second polymeric material which is soluble or dispersible in aqueous solution optionally containing compounds that absorb and convert light or radiation to heat and/or a visible coloured dye or pigment; the first intermediate layer and the third layer being applied with a solvent that does not substantially dissolve the converted first layer. The assembly is useful as off-set lithographic printing plates, for color proofing films and photoresist. The invention also refers to the process for making such assembly and products formed therefrom.

    摘要翻译： 本发明涉及正工作热成像组件，其包括：A）衬底; 和B）复合层结构的热敏成像元件，包括：（i）基底上的可溶于碱水溶液的聚合材料的第一层，任选地含有吸收和转化光的化合物和/或着色染料 或颜料; 所述第一层在其表面上通过在高温下用溶液处理而被转化，所述溶液含有活性化合物或能够使所述第一聚合物材料在接触点处不溶于碱性显影剂的化合物; 第一层是亲油的; （ii）任选地，在所述基材和所述第一层之间的第一中间层具有可溶于或分散于水溶液中的第二聚合物材料，所述第二聚合物材料任选地含有吸收并将光或辐射转化成热和/或着色染料或颜料的化合物 由基本不溶解第一层的溶剂涂布; 和（iii）可选地，在转化的第一层上方的第三层或顶层，并且由可溶或可分散在水溶液中的第二聚合物材料组成，任选地含有吸收和转换光或辐射至热的化合物和/或可见的着色染料 或颜料; 第一中间层和第三层被施加有基本上不溶解转化的第一层的溶剂。 该组件可用作偏光平版印刷版，用于防色膜和光致抗蚀剂。 本发明还涉及用于制造这样的组装和由其形成的产品的方法。

    Photosensitive resin composition, process for forming relief pattern, and electronic component
    3.
    发明申请
    Photosensitive resin composition, process for forming relief pattern, and electronic component 失效
    感光树脂组合物，形成浮雕图案的方法和电子部件

    公开(公告)号：US20040142275A1

    公开(公告)日：2004-07-22

    申请号：US10701448

    申请日：2003-11-06

    发明人： Hiroshi Komatsu

    IPC分类号： G03F007/004 ,  G03F007/30 ,  G03C001/492 ,  G03F007/038

    CPC分类号： G03F7/0233 ,  H05K3/4676

    摘要： A photosensitive resin composition is disclosed that includes (A) a heat-resistant polymer of the general formula (1): 1 (where the symbols are as defined in the specification), (B) a photoreactive compound, and (C) a solvent. A relief pattern is formed from the composition by applying the composition to a support substrate and drying it to form a photosensitive resin film; exposing the dried film; developing the exposed film using an alkaline aqueous solution; and heating the developed photosensitive resin film. Also disclosed is an electronic component that includes an electronic device having such a pattern.

    摘要翻译： 公开了一种感光性树脂组合物，其包含（A）通式（1）的耐热性聚合物（其符号如说明书中所定义），（B）光反应性化合物和（C）溶剂。 通过将组合物施加到支撑基材上并干燥以形成感光性树脂膜，由组合物形成浮雕图案; 暴露干膜; 使用碱性水溶液显影曝光的膜; 并加热显影的感光树脂膜。 还公开了一种电子部件，其包括具有这种图案的电子装置。

    Resist composition
    4.
    发明申请
    Resist composition 有权
    抗蚀组成

    公开(公告)号：US20040106063A1

    公开(公告)日：2004-06-03

    申请号：US10615683

    申请日：2003-07-09

    发明人： Jun Hatakeyama ,  Youichi Ohsawa ,  Takeru Watanabe

    IPC分类号： G03F007/039 ,  G03F007/021 ,  G03F007/038 ,  G03F007/075

    CPC分类号： G03F7/0392 ,  G03F7/0045 ,  Y10S430/106

    摘要： Although use of a nitrogen-containing compound as a basic compound component of a resist composition makes it possible to ease the T-top problem at an acid dissociation constant pKa falling within a range of 2 to 6, it is accompanied with the problem that the reaction, that is, acid diffusion upon use of a highly-reactive acid-labile group cannot be controlled. In order to overcome this problem, one or more basic compounds selected from those represented by the following formulas (I) to (III) and (1) to (4) are employed. 1 2

    摘要翻译： 尽管使用含氮化合物作为抗蚀剂组合物的碱性化合物组分可以使酸解离常数pKa在2至6的范围内缓解T顶部问题，但是伴随着如下问题： 反应，即使用高反应性酸不稳定基团时的酸扩散是不能控制的。 为了克服这个问题，使用一种或多种选自由下式（I）至（III）和（1）至（4）表示的化合物的碱性化合物。

    Polymerizable composition and planographic printing plate precursor
    6.
    发明申请
    Polymerizable composition and planographic printing plate precursor 有权
    可聚合组合物和平版印刷版前体

    公开(公告)号：US20040072101A1

    公开(公告)日：2004-04-15

    申请号：US10673332

    申请日：2003-09-30

    申请人： FUJI PHOTO FILM CO., LTD.

    发明人： Atsushi Sugasaki ,  Kazuto Kunita ,  Kazuhiro Fujimaki

    IPC分类号： G03F007/038

    CPC分类号： B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/117 ,  Y10S430/145

    摘要： The present invention provides a planographic printing plate precursor including on a support a photosensitive layer that contains a polymerizable composition containing a specific binder polymer having a repeating unit of formula (I), an infrared absorbent, a polymerization initiator and a polymerizable compound, 1 wherein R1 represents a hydrogen atom or a methyl group; R2 represents a linking group which includes two or more atoms selected from a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom and a sulfur atom and has a number of atoms of 2 to 82; A represents an oxygen atom or nullNR3null in which R3 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms; and n represents an integer of 1 to 5. The invention also provides a planographic printing plate precursor provided with a specific photosensitive layer with respect to an alkaline developer.

    摘要翻译： 本发明提供一种平版印刷版原版，其在载体上含有含有具有式（I）的重复单元的特定粘合剂聚合物的聚合性组合物，红外线吸收剂，聚合引发剂和聚合性化合物的感光层，其中R 1表示氢原子或甲基; R 2表示包含选自碳原子，氢原子，氧原子，氮原子和硫原子中的2个以上原子并且原子数为2〜82的连接基团; A表示氧原子或-NR 3 - ，其中R 3表示氢原子或具有1〜10个碳原子的一价烃基; 并且n表示1〜5的整数。本发明还提供了相对于碱性显影剂具有特定感光层的平版印刷版原版。

    Production of flexographic printing plates by thermal development
    8.
    发明申请
    Production of flexographic printing plates by thermal development 有权
    通过热开发生产柔版印刷版

    公开(公告)号：US20040048199A1

    公开(公告)日：2004-03-11

    申请号：US10414468

    申请日：2003-04-14

    发明人： Jens Schadebrodt ,  Margit Hiller

    IPC分类号： G03F007/038

    CPC分类号： G03F7/36 ,  B41C1/00 ,  B41C1/05 ,  G03F7/033 ,  Y10S430/145 ,  Y10S430/146

    摘要： Flexographic printing plates are produced by thermal development by a process in which an imagewise exposed flexographic printing element is developed by heating and removing the softened, unpolymerized parts of the relief-forming layer, the flexographic printing element used comprising an olefin/(meth)acrylate copolymer having an olefin content of from 50 to 94 mol %. The photopolymerizable flexographic printing element comprises an olefin/(meth)acrylate copolymer having a content of from 50 to 94 mol % of olefin monomers, from 6 to 50 mol % of (meth)acrylate monomers and from 0 to 5 mol % of further comonomers. This flexographic printing element is used for the production of flexographic printing plates both by thermal development and by development by means of washout compositions.

    摘要翻译： 柔版印刷版通过热成像制造，其中通过加热和除去形成浮雕的层的软化的未聚合部分，使用的柔性版印刷元件来显影图像曝光的柔性版印刷元件，所述柔性版印刷元件包含烯烃/（甲基）丙烯酸酯 共聚物，其烯烃含量为50〜94摩尔％。 可光聚合柔性版印刷元件包含烯烃单体含量为50-94摩尔％，（甲基）丙烯酸酯单体6-50摩尔％和其它共聚单体的0-5摩尔％的烯烃/（甲基）丙烯酸酯共聚物 。 该柔性版印刷元件用于通过热显影和通过冲洗组合物的显影来生产柔版印刷版。

    Method of manufacturing print belts
    9.
    发明申请
    Method of manufacturing print belts 失效
    打印带的制造方法

    公开(公告)号：US20040043336A1

    公开(公告)日：2004-03-04

    申请号：US10456791

    申请日：2003-06-06

    发明人： Arnaud De Ponnat ,  Mickael Bernou ,  Damien Leleu ,  Faye Renaud

    IPC分类号： G03F007/40 ,  B05C001/02 ,  G03F007/038

    CPC分类号： G03F7/2012 ,  B41C1/1008 ,  B41C1/1083 ,  B41C2210/04 ,  B41C2210/24 ,  G03F7/00 ,  G03F7/16 ,  G03F7/2035

    摘要： A manufacturing line for manufacturing a print belt comprising a support-forming strip and a photopolymerized resin forming printing characters, the line comprises spreader means adapted to spread the resin on the strip, photopolymerizer means adapted to solidify that portion of the resin that is to correspond to the printing characters, remover means adapted to remove the non-photopolymerized resin from the strip, and drive means adapted to drive the strip in translation in such a manner that each of its transverse sections passes in succession in register with the spreader means, the photopolymerizer means, and the remover means.

    摘要翻译： 一种用于制造印刷带的生产线，其包括支撑形成条和形成印刷字符的光聚合树脂，该线包括适于将树脂铺展在条上的铺展装置，适于固化所述树脂相应部分的光聚合器装置 对于打印字符，适于从条带去除非光聚合树脂的去除装置和适于以这样的方式驱动条​​带的驱动装置，使得其横向部分中的每一个依次通过与吊具装置对准， 光聚合装置和去除装置。

    Protecting groups for lithographic resist compositions
    10.
    发明申请
    Protecting groups for lithographic resist compositions 审中-公开
    光刻胶组合物的保护基

    公开(公告)号：US20040009424A1

    公开(公告)日：2004-01-15

    申请号：US10377422

    申请日：2003-02-28

    申请人： MASS INSTITUTE OF TECHNOLOGY (MIT)

    发明人： Theodore H. Fedynyshyn ,  Michael Sworin ,  Roger Sinta

    IPC分类号： G03F007/038 ,  G03F007/26

    CPC分类号： G03F7/0046 ,  G03F7/0392 ,  G03F7/0395

    摘要： The present invention provides acid labile protecting groups that can be utilized to protect one or more monomeric units of a polymeric constituent of a photoresist composition suitable for use in lithography. For example, in one embodiment, the acid labile protecting group is selected to be t-butoxymethyl which can be employed to protect, e.g., a hydroxystyrene or an acrylic acid moiety. The photoresist compositions of the invention can be utilized at any wavelength suitable for lithography, and particularly, at wavelengths below 248 nm, e.g., 157 nm.

    摘要翻译： 本发明提供了可用于保护适合用于光刻的光致抗蚀剂组合物的聚合物组分的一种或多种单体单元的酸不稳定保护基团。 例如，在一个实施方案中，酸不稳定保护基团选择为叔丁氧基甲基，其可用于保护例如羟基苯乙烯或丙烯酸部分。 本发明的光致抗蚀剂组合物可以适用于适于光刻的任何波长，特别是波长低于248nm，例如157nm。