发明申请
- 专利标题： Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist compositon comprising the same
- 专利标题（中）： 具有氟化乙二醇基的感光性聚合物和包含其的化学增幅抗蚀剂组合物
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申请号： US10289108申请日： 2002-11-05
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公开(公告)号： US20030125511A1公开(公告)日： 2003-07-03
- 发明人: Sang-Jun Choi , Joo-Tae Moon , Sang-Gyun Woo , Kwang-Sub Yoon , Ki-Yong Song
- 申请人： Sumsung Electronics Co., Ltd.
- 申请人地址： KR Hwasung-city
- 专利权人： Sumsung Electronics Co., Ltd.
- 当前专利权人： Sumsung Electronics Co., Ltd.
- 当前专利权人地址： KR Hwasung-city
- 优先权： KR01-69228 20011107
- 主分类号： C08G073/24
- IPC分类号： C08G073/24 ; C08F114/18 ; C08F014/18
摘要：
A photosensitive polymer comprises a fluorinated ethylene glycol group and a chemically amplified resist composition including the photosensitive polymer. The photosensitive polymer has a weight average molecular weight of about 3,000-50,000 having a repeating unit as follows: 1 wherein R1 is a hydrogen atom or methyl group, and R2 is a fluorinated ethylene glycol group having 3 to 10 carbon atoms.
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