专利检索 ap:("Sumsung Electronics Co., Ltd.") AND inv:"Sang-Gyun Woo" 第 1 页

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发明申请
Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist compositon comprising the same 有权
标题翻译：具有氟化乙二醇基的感光性聚合物和包含其的化学增幅抗蚀剂组合物

公开(公告)号：US20030125511A1

公开(公告)日：2003-07-03

申请号：US10289108

申请日：2002-11-05

申请人： Sumsung Electronics Co., Ltd.

发明人： Sang-Jun Choi , Joo-Tae Moon , Sang-Gyun Woo , Kwang-Sub Yoon , Ki-Yong Song

IPC分类号： C08G073/24 , C08F114/18 , C08F014/18

CPC分类号： G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/111

摘要： A photosensitive polymer comprises a fluorinated ethylene glycol group and a chemically amplified resist composition including the photosensitive polymer. The photosensitive polymer has a weight average molecular weight of about 3,000-50,000 having a repeating unit as follows: 1 wherein R1 is a hydrogen atom or methyl group, and R2 is a fluorinated ethylene glycol group having 3 to 10 carbon atoms.

摘要翻译： 光敏聚合物包含氟化乙二醇基团和包含光敏聚合物的化学放大抗蚀剂组合物。感光性聚合物的重均分子量为约3,000〜50,000，具有如下重复单元：其中，R 1为氢原子或甲基，R 2为碳原子数3〜10的氟化乙二醇基。