Invention Application
- Patent Title: Scanning probe system with spring probe
-
Application No.: US10112215Application Date: 2002-03-29
-
Publication No.: US20030182993A1Publication Date: 2003-10-02
- Inventor: Thomas Hantschel , Eugene M. Chow , David K. Fork
- Applicant: Xerox Corporation
- Applicant Address: null
- Assignee: Xerox Corporation
- Current Assignee: Xerox Corporation
- Current Assignee Address: null
- Main IPC: G01N023/00
- IPC: G01N023/00

Abstract:
Scanning probe systems, which include scanning probe microscopes (SPMs), atomic force microscope (AFMs), or profilometers, are disclosed that use cantilevered spring (e.g., stressy metal) probes formed on transparent substrates. When released, a free end bends away from the substrate to form the cantilevered spring probe, which has an in-plane or out-of-plane tip at its free end. The spring probe is mounted in a scanning probe system and is used to scan or otherwise probe a substrate surface. A laser beam is directed through the transparent substrate onto the probe to measure tip movement during scanning or probing. Other detection schemes can also be used (e.g., interferometry, capacitive, piezoresistive). The probes are used for topography, electrical, optical and thermal measurements. The probes also allow an SPM to operate as a depth gauge.
Public/Granted literature
- US06668628B2 Scanning probe system with spring probe Public/Granted day:2003-12-30
Information query