Invention Application
US20030205739A1 Single crystal silicon sensor with high aspect ratio and curvilinear structures and associated method
审中-公开
具有高纵横比和曲线结构的单晶硅传感器及相关方法
- Patent Title: Single crystal silicon sensor with high aspect ratio and curvilinear structures and associated method
- Patent Title (中): 具有高纵横比和曲线结构的单晶硅传感器及相关方法
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Application No.: US09928194Application Date: 2001-08-11
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Publication No.: US20030205739A1Publication Date: 2003-11-06
- Inventor: Kurt E. Petersen , Nadim Maluf , Wendell McCulley , John Logan , Erno Klaasen , Jan Mark Noworolski
- Main IPC: H01L029/768
- IPC: H01L029/768 ; H01L027/148

Abstract:
In one aspect, the invention provides semiconductor sensor which includes a first single crystal silicon wafer layer. A single crystal silicon structure is formed in the first wafer layer. The structure includes two oppositely disposed substantially vertical major surfaces and two oppositely disposed generally horizontal minor surfaces. The aspect ratio of major surface to minor surface is at least 5:1. A carrier which includes a recessed region is secured to the first wafer layer such that said structure is suspended opposite the recessed region.
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