发明申请
US20030211645A1 Gallium nitride-based semiconductor light emitting device and method 有权
氮化镓基半导体发光器件及方法

  • 专利标题: Gallium nitride-based semiconductor light emitting device and method
  • 专利标题(中): 氮化镓基半导体发光器件及方法
  • 申请号: US10410989
    申请日: 2003-04-08
  • 公开(公告)号: US20030211645A1
    公开(公告)日: 2003-11-13
  • 发明人: Chia-Ming LeeJen-Inn Chyi
  • 申请人: Tekcore Co., Ltd.
  • 申请人地址: null
  • 专利权人: Tekcore Co., Ltd.
  • 当前专利权人: Tekcore Co., Ltd.
  • 当前专利权人地址: null
  • 主分类号: H01L021/00
  • IPC分类号: H01L021/00
Gallium nitride-based semiconductor light emitting device and method
摘要:
According to a preferred embodiment of the present invention, there is provided a novel and optimal semiconductor light emitting device comprising a substrate, an n layer disposed co-extensively on the substrate, an nnullnull layer disposed non-extensively and flush on one side of the n layer. Furthermore, a pnull layer is disposed co-extensively on the nnullnull layer of the LED according to the invention, with a p layer further disposed co-extensively on the pnull layer. A p cladding layer is disposed co-extensively on the p layer. A multiple quantum well (MQW) layer is disposed co-extensively on the p cladding layer, and an n cladding layer is further disposed co-extensively on the MQW layer. A second n layer is disposed co-extensively on the n cladding layer. An nnull layer is disposed co-extensively on the second n layer of the LED according to the invention. After partially etching the device, an n electrode is formed opposite nnullnull layer non-extensively on the surface of n layer, and a second n electrode is formed non-extensively (without etching) upon the nnull layer.
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