发明申请
- 专利标题: Method of conforming an adherent film to a substrate by application of vacuum
- 专利标题(中): 通过施加真空使粘附膜与基底相适应的方法
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申请号: US10167347申请日: 2002-06-11
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公开(公告)号: US20030226637A1公开(公告)日: 2003-12-11
- 发明人: John R. David , Jeffrey O. Emslander , Danny L. Fleming , Michael R. Kesti , Larry A. Meixner , Frank T. Sher , Ronald S. Steelman , David J. Yarusso
- 主分类号: B32B031/00
- IPC分类号: B32B031/00
摘要:
Films are closely conformed to substrates by reducing the air pressure to a subatmospheric level in at least one airflow pathway that is present in the film or the substrate. The reduced air pressure enables the film to tightly contact the substrate in locations where protrusions or depressions on the substrate are present. The method is particularly useful for conforming film containing graphics to a variety of substrates such as the sides of semi-trailers or concrete block walls, even in instances where the semi-trailer sides include rivets and/or grooves and where the concrete block wall is relatively rough.
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