发明申请
US20030226641A1 Externally excited torroidal plasma source with magnetic control of ion distribution
失效
外部激发的环形等离子体源与磁控制的离子分布
- 专利标题: Externally excited torroidal plasma source with magnetic control of ion distribution
- 专利标题(中): 外部激发的环形等离子体源与磁控制的离子分布
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申请号: US10164327申请日: 2002-06-05
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公开(公告)号: US20030226641A1公开(公告)日: 2003-12-11
- 发明人: Kenneth S. Collins , Hiroji Hanawa , Yan Ye , Kartik Ramaswamy , Andrew Nguyen , Michael S. Barnes , Huong Thanh Nguyen
- 申请人: Applied Materials, Inc.
- 申请人地址: null
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: null
- 主分类号: C23F001/00
- IPC分类号: C23F001/00 ; C23C016/00
摘要:
A plasma reactor is described that includes a vacuum chamber defined by an enclosure including a side wall and a workpiece support pedestal within the chamber defining a processing region overlying said pedestal. The chamber has at least a first pair of ports near opposing sides of said processing region and a first external reentrant tube is connected at respective ends thereof to the pair of ports. The reactor further includes a process gas injection apparatus (such as a gas distribution plate) and an RF power applicator coupled to the reentrant tube for applying plasma source power to process gases within the tube to produce a reentrant torroidal plasma current through the first tube and across said processing region. A magnet controls radial distribution of plasma ion density in the processing region, the magnet having an elongate pole piece defining a pole piece axis intersecting the processing region.
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