The invention concerns a method for making an multilevel interconnection circuitry comprising conductor tracks and micro-vias. The method for producing at least one of the levels comprises the following steps: a) on a substrate including at its surface metallizable and/or potentially metallizable parts (102), forming a first insulating photosensitive resin layer (103) comprising a compound capable of inducing subsequent metallization; b) exposing and revealing the first layer (103) so as to selectively uncover the metallizable and/or potentially metallizable parts (102) of the substrate; c) forming, by metallization, metal conductor tracks (111) and micro-vias (110) at the surface of the first insulating photosensitive resin layer (113) and of the parts uncovered during step b), by providing a second photosensitive resin layer (105) forming a selective protection, the second photosensitive resin layer (105) being eliminated.