Invention Application
- Patent Title: Mask for laser irradiation and apparatus for laser crystallization using the same
- Patent Title (中): 用于激光照射的掩模和使用其的激光结晶装置
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Application No.: US10705891Application Date: 2003-11-13
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Publication No.: US20040096754A1Publication Date: 2004-05-20
- Inventor: Yun-Ho Jung
- Applicant: LG.Philips LCD Co., Ltd.
- Applicant Address: null
- Assignee: LG.Philips LCD Co., Ltd.
- Current Assignee: LG.Philips LCD Co., Ltd.
- Current Assignee Address: null
- Priority: KR2002-071704 20021118
- Main IPC: G03F009/00
- IPC: G03F009/00 ; G03B027/00
Abstract:
A laser beam mask for shaping a laser beam includes a base substrate having first and second surfaces and having at least one first open portion, and a reflecting layer on the first surface of the base substrate, wherein the reflecting layer has at least one second open portion corresponding to the at least one first open portion and totally reflects the laser beam.
Public/Granted literature
- US07205076B2 Mask for laser irradiation and apparatus for laser crystallization using the same Public/Granted day:2007-04-17
Information query
