Mask for laser irradiation and apparatus for laser crystallization using the same
    1.
    发明申请
    Mask for laser irradiation and apparatus for laser crystallization using the same 有权
    用于激光照射的掩模和使用其的激光结晶装置

    公开(公告)号:US20040096754A1

    公开(公告)日:2004-05-20

    申请号:US10705891

    申请日:2003-11-13

    Inventor: Yun-Ho Jung

    CPC classification number: G03B27/00

    Abstract: A laser beam mask for shaping a laser beam includes a base substrate having first and second surfaces and having at least one first open portion, and a reflecting layer on the first surface of the base substrate, wherein the reflecting layer has at least one second open portion corresponding to the at least one first open portion and totally reflects the laser beam.

    Abstract translation: 用于成形激光束的激光束掩模包括具有第一和第二表面并具有至少一个第一开口部分的基底基板和在基底基板的第一表面上的反射层,其中反射层具有至少一个第二开口 部分对应于至少一个第一开口部分并且全反射激光束。

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