Invention Application
- Patent Title: Probe array and method of its manufacture
- Patent Title (中): 探头阵列及其制造方法
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Application No.: US10302969Application Date: 2002-11-25
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Publication No.: US20040099641A1Publication Date: 2004-05-27
- Inventor: Gaetan L. Mathieu , Benjamin N. Eldridge , Gary W. Grube
- Applicant: FormFactor, Inc.
- Applicant Address: null
- Assignee: FormFactor, Inc.
- Current Assignee: FormFactor, Inc.
- Current Assignee Address: null
- Main IPC: B23H001/00
- IPC: B23H001/00 ; B23H009/00

Abstract:
A method of forming a probe array includes forming a layer of tip material over a block of probe material. A first electron discharge machine (EDM) electrode is positioned over the layer of tip material, the EDM electrode having a plurality of openings corresponding to a plurality of probes to be formed. Excess material from the layer of tip material and the block of probe material is removed to form the plurality of probes. A substrate having a plurality of through holes corresponding to the plurality of probes is positioned so that the probes penetrate the plurality of through holes. The substrate is bonded to the plurality of probes. Excess probe material is removed so as to planarize the substrate.
Public/Granted literature
- US07122760B2 Using electric discharge machining to manufacture probes Public/Granted day:2006-10-17
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