发明申请
- 专利标题： Alignment apparatus, exposure apparatus, and device manufacturing method
- 专利标题（中）： 对准装置，曝光装置和装置的制造方法
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申请号： US10670241申请日： 2003-09-26
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公开(公告)号： US20040112164A1公开(公告)日： 2004-06-17
- 发明人: Toshiya Asano , Yugo Shibata
- 申请人： Canon Kabushiki Kaisha
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 优先权： JP2002-287056 20020930; JP2003-324688 20030917
- 主分类号： G05G011/00
- IPC分类号： G05G011/00
摘要：
An alignment apparatus moves an X-Y slider together with X and Y beams. Electromagnetic guides (electromagnetic mechanisms) are interposed between the X-Y slider, the X beam, and the Y beam. The electromagnetic guides include alignment and acceleration electromagnets attached to the X-Y slider, and targets attached to the X and Y beams. The alignment electromagnet is feedback-controlled, whereas the acceleration electromagnet is feedforward-controlled.
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