- 专利标题: Wafer processing apparatus including clean box stopping mechanism
-
申请号: US10703498申请日: 2003-11-10
-
公开(公告)号: US20040127048A1公开(公告)日: 2004-07-01
- 发明人: Tsutomu Okabe , Hiroshi Igarashi , Toshihiko Miyajima
- 申请人: TDK CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: TDK CORPORATION
- 当前专利权人: TDK CORPORATION
- 当前专利权人地址: JP Tokyo
- 主分类号: H01L021/461
- IPC分类号: H01L021/461 ; H01L021/302
摘要:
The semiconductor wafer processing apparatus includes a clean box having an opening, a lid for closing the opening, a door to be in contact with the lid and to detach the lid from the clean box, a first stopper adapted to move in conjunction with movement of the clean box without a change in its relative positional relationship with the clean box, and an unmoved second stopper. With this structure, it is possible to prevent the clean box moved on the semiconductor wafer processing apparatus from colliding with the apparatus, even if the clean box manufactured by molding using a reinforced plastic in accordance with a prescribed standard includes a manufacturing error in its size.
信息查询