公开(公告)号：US20040127048A1

公开(公告)日：2004-07-01

申请号：US10703498

申请日：2003-11-10

申请人： TDK CORPORATION

发明人： Tsutomu Okabe ,  Hiroshi Igarashi ,  Toshihiko Miyajima

IPC分类号： H01L021/461 ,  H01L021/302

CPC分类号： H01L21/67772

摘要： The semiconductor wafer processing apparatus includes a clean box having an opening, a lid for closing the opening, a door to be in contact with the lid and to detach the lid from the clean box, a first stopper adapted to move in conjunction with movement of the clean box without a change in its relative positional relationship with the clean box, and an unmoved second stopper. With this structure, it is possible to prevent the clean box moved on the semiconductor wafer processing apparatus from colliding with the apparatus, even if the clean box manufactured by molding using a reinforced plastic in accordance with a prescribed standard includes a manufacturing error in its size.

公开(公告)号：US20040035493A1

公开(公告)日：2004-02-26

申请号：US10600334

申请日：2003-06-23

申请人： TDK CORPORATION

发明人： Toshihiko Miyajima ,  Tsutomu Okabe

IPC分类号： B65B001/04

CPC分类号： H01L21/67126 ,  H01L21/67772 ,  Y10S414/139

摘要： A clean box is composed of a box body having an opening in one surface thereof and a lid member for closing the opening. An annular groove is formed so as to surround the opening on one of the box body or the lid member for defining a suction space sealed between the lid member and the box body under the condition that the lid member is mounted on the box body. Furthermore, intake/exhaust ports are provided for vacuum exhaust/release from the outside.

摘要翻译： 清洁箱由在其一个表面上具有开口的盒体和用于封闭开口的盖构件组成。 环形槽形成为围绕箱主体或盖部件中的一个的开口，用于限定在盖部件安装在箱体上的状态下密封在盖部件与箱体之间的吸入空间。 此外，进气/排气口用于从外部进行真空排气/释放。

公开(公告)号：US20040237244A1

公开(公告)日：2004-12-02

申请号：US10849024

申请日：2004-05-20

申请人： TDK CORPORATION

发明人： Hitoshi Suzuki ,  Toshihiko Miyajima

IPC分类号： A47L005/38

CPC分类号： H01L21/67393 ,  H01L21/67126

摘要： Disclosed is a sealing system for intake and exhaust ports used when performing purging on the interior of a container accommodating objects, such as an FOUP, wherein the sealing of the intake and exhaust lines is effected in a satisfactory manner with respect to the external environment. The sealing member has a ring-shaped main body portion, an inner peripheral lip protruding from the ring inner peripheral portion of the main body portion, and an outer peripheral lip protruding from the ring outer peripheral portion of the main body portion, wherein the space formed by the inner peripheral lip, the outer peripheral lip, etc. can be evacuated.

摘要翻译： 本发明公开了一种进气和排气口的密封系统，当在诸如FOUP的容器收容物体的内部进行吹扫时使用，其中进气和排气管线的密封以令人满意的方式相对于外部环境进行。 密封构件具有环状主体部，从主体部的环内周部突出的内周唇部和从主体部的环外周部突出的外周唇部， 由内周缘，外周唇等形成。

公开(公告)号：US20040127029A1

公开(公告)日：2004-07-01

申请号：US10330098

申请日：2002-12-30

申请人： TDK CORPORATION

发明人： Tsutomu Okabe ,  Hiroshi Igarashi ,  Toshihiko Miyajima

IPC分类号： H01L021/302 ,  H01L021/461

CPC分类号： H01L21/67772

摘要： The semiconductor wafer processing apparatus includes a clean box having an opening, a lid for closing the opening, a door to be in contact with the lid and to detach the lid from the clean box, a first stopper adapted to move in conjunction with movement of the clean box without a change in its relative positional relationship with the clean box, and an unmoved second stopper. With this structure, it is possible to prevent the clean box moved on the semiconductor wafer processing apparatus from colliding with the apparatus, even if the clean box manufactured by molding using a reinforced plastic in accordance with a prescribed standard includes a manufacturing error in its size.

摘要翻译： 半导体晶片处理装置包括具有开口的清洁盒，用于封闭开口的盖，与盖接触并将盖与清洁盒分离的门，适于与第 干净的盒子与其相对的位置关系不会改变，并且有一个不动的第二个止动器。 利用这种结构，即使根据规定的标准通过使用强化塑料的成型而制造的清洁盒包括其尺寸的制造误差，也可以防止在半导体晶片处理装置上移动的清洁盒与装置碰撞 。

公开(公告)号：US20040099826A1

公开(公告)日：2004-05-27

申请号：US10698421

申请日：2003-11-03

申请人： TDK CORPORATION

发明人： Hiroshi Igarashi ,  Tsutomu Okabe ,  Toshihiko Miyajima

IPC分类号： G01V008/00

CPC分类号： H01L21/67265 ,  G01V8/12 ,  H01L21/67772 ,  Y10S414/137

摘要： A wafer processing apparatus on which a pod having an opening is detachably mounted is provided with a door unit and a mapping unit provided with a transmitting type sensor having an emitter and a detector forming a slot therebetween. The emitter and the detector are moved toward the opening in the pod and are plunged into the interior of the pod after a door is opened by the door unit, and the slot between the emitter and the detector crosses an end portion of a wafer to thereby detect the presence or absence of the wafer. Thereby, a mechanism portion liable to produce dust which may adhere to the wafer and cause the contamination thereof can be disposed separately from the pod.

公开(公告)号：US20040126206A1

公开(公告)日：2004-07-01

申请号：US10330114

申请日：2002-12-30

申请人： TDK CORPORATION

发明人： Shinichi Araya ,  Toshihiko Miyajima ,  Hideaki Watanabe

IPC分类号： B65G001/00

CPC分类号： H01L21/67781 ,  H01L21/67772

摘要： The invention is intended to prevent, in a local clean system, attachment of particles to a wafer, which would occur when the wafer is taken out from a clean box. To achieve the object, an operating method of a local clean system including a processing apparatus, a load port annexed thereto and a clean box set to the load port, comprises the steps of, setting the clean box on the load port, opening a communication path between the load port and the processing apparatus, opening, after said communication path is opened fully, the clean box and bringing a cassette in which a wafer is accommodated inside the clean box into an interior of the load port, and taking the wafer out of the cassette and transferring the wafer into the interior of the processing apparatus.

摘要翻译： 本发明旨在防止在局部清洁系统中将颗粒附着到晶片上，当晶片从干净的盒子中取出时会发生这种情况。 为了实现该目的，本发明的一种局部清洁系统的操作方法，包括处理装置，与其连接的装载端口和设置于装载端口的清洁箱，包括以下步骤：将清洁箱设置在装载端口上，打开通信 负载端口和处理装置之间的路径，在完全打开所述通信路径之后，打开清洁盒，并将其中容纳晶片的盒装在清洁箱内部进入负载端口的内部，并将晶片取出 并将晶片转移到处理设备的内部。

公开(公告)号：US20040099824A1

公开(公告)日：2004-05-27

申请号：US10301841

申请日：2002-11-22

申请人： TDK CORPORATION

发明人： Hiroshi Igarashi ,  Tsutomu Okabe ,  Toshihiko Miyajima

IPC分类号： G01V008/00 ,  G01N021/86

CPC分类号： H01L21/67265 ,  G01V8/12 ,  H01L21/67772 ,  Y10S414/137

摘要： A wafer processing apparatus on which a pod having an opening is detachably mounted is provided with a door unit and a mapping unit provided with a transmitting type sensor having an emitter and a detector forming a slot therebetween. The emitter and the detector are moved toward the opening in the pod and are plunged into the interior of the pod after a door is opened by the door unit, and the slot between the emitter and the detector crosses an end portion of a wafer to thereby detect the presence or absence of the wafer. Thereby, a mechanism portion liable to produce dust which may adhere to the wafer and cause the contamination thereof can be disposed separately from the pod.

摘要翻译： 具有可拆卸地安装有开口的容器的晶片处理装置设置有门单元和映射单元，该单元设置有具有发射器的传输型传感器和在其间形成狭槽的检测器。 发射器和检测器朝向容器中的开口移动，并且在门被门单元打开之后被插入到容器的内部，并且发射器和检测器之间的槽与晶片的端部相交，由此 检测晶片的存在或不存在。 因此，可以与容器分开设置容易产生可能附着在晶片上并导致其污染的灰尘的机构部分。