- 专利标题: Apparatus and method for vaporizing solid precursor for CVD or atomic layer deposition
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申请号: US10792323申请日: 2004-03-03
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公开(公告)号: US20040170403A1公开(公告)日: 2004-09-02
- 发明人: Lawrence C. Lei
- 申请人: Applied Materials, Inc.
- 申请人地址: null
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: null
- 主分类号: C23C014/26
- IPC分类号: C23C014/26
摘要:
An apparatus and method for effectively and controllably vaporizing a solid precursor material is provided. In particular, the present invention provides an apparatus that includes a housing defining a sealed interior volume having an inlet for receiving a carrier gas, at least one surface within the housing for the application of a solid precursor, and a heating member for heating the solid precursor. The heating member can be located in the housing or in the surface within the housing. The surface can be a rod, baffle, mesh, or grating, and is preferably s-shaped or cone-shaped. Optionally, an outlet connects the housing to a reaction chamber. A method for vaporizing a solid precursor using the apparatus of the present invention is also provided.
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