Invention Application
- Patent Title: Antistatic composition
- Patent Title (中): 防静电组成
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Application No.: US10761821Application Date: 2004-01-21
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Publication No.: US20040171762A1Publication Date: 2004-09-02
- Inventor: Hui Chin , Christopher J. Fagouri
- Main IPC: C08G063/48
- IPC: C08G063/48 ; C08L071/02

Abstract:
Polymer compositions comprising a) a polymer substrate selected from the group consisting of the polyolefins, polyesters, polyamides and polylactic acids and b) a combination of i) at least one permanent antistatic additive selected from the group consisting of the polyetheresteramides and ii) at least one migratory antistatic additive selected from the group consisting of the alkylsulfonic acid salts, the alkyl diethanolamines and the alkyl diethanolamides, are effectively antistatic.
Public/Granted literature
- US07361291B2 Antistatic composition Public/Granted day:2008-04-22
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