发明申请
- 专利标题: Antistatic composition
- 专利标题(中): 防静电组成
-
申请号: US10761821申请日: 2004-01-21
-
公开(公告)号: US20040171762A1公开(公告)日: 2004-09-02
- 发明人: Hui Chin , Christopher J. Fagouri
- 主分类号: C08G063/48
- IPC分类号: C08G063/48 ; C08L071/02
摘要:
Polymer compositions comprising a) a polymer substrate selected from the group consisting of the polyolefins, polyesters, polyamides and polylactic acids and b) a combination of i) at least one permanent antistatic additive selected from the group consisting of the polyetheresteramides and ii) at least one migratory antistatic additive selected from the group consisting of the alkylsulfonic acid salts, the alkyl diethanolamines and the alkyl diethanolamides, are effectively antistatic.
公开/授权文献
- US07361291B2 Antistatic composition 公开/授权日:2008-04-22