发明申请
US20040195785A1 Chuck rollers and pins for substrate cleaning and drying system
失效
用于衬底清洁和干燥系统的卡盘辊和销
- 专利标题: Chuck rollers and pins for substrate cleaning and drying system
- 专利标题(中): 用于衬底清洁和干燥系统的卡盘辊和销
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申请号: US10406711申请日: 2003-04-02
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公开(公告)号: US20040195785A1公开(公告)日: 2004-10-07
- 发明人: Chin-Tsan Jan
- 申请人: Taiwan Semicondutor Manufacturing Co., Ltd.
- 申请人地址: null
- 专利权人: Taiwan Semicondutor Manufacturing Co., Ltd.
- 当前专利权人: Taiwan Semicondutor Manufacturing Co., Ltd.
- 当前专利权人地址: null
- 主分类号: B23B031/12
- IPC分类号: B23B031/12
摘要:
A design for chuck rollers and a design for chuck pins for a wafer cleaning and drying system is disclosed. Each of the chuck rollers includes a roller head which ensures proper engagement of a wafer with the chuck rollers for rotation of the wafer during a wafer scrubbing process. Each of the chuck pins is provided with an extending flange or salient to prevent upward movement of and disengagement of the wafer from the chuck pins as the wafer is rotated during a wafer scrubbing and drying process. Each chuck pin may also present a wafer support surface of enhanced surface area for supporting the wafer on the chuck pin.
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