公开(公告)号：US20040195785A1

公开(公告)日：2004-10-07

申请号：US10406711

申请日：2003-04-02

申请人： Taiwan Semicondutor Manufacturing Co., Ltd.

发明人： Chin-Tsan Jan

IPC分类号： B23B031/12

CPC分类号： H01L21/68728 ,  H01L21/67046 ,  Y10T279/17231 ,  Y10T279/18

摘要： A design for chuck rollers and a design for chuck pins for a wafer cleaning and drying system is disclosed. Each of the chuck rollers includes a roller head which ensures proper engagement of a wafer with the chuck rollers for rotation of the wafer during a wafer scrubbing process. Each of the chuck pins is provided with an extending flange or salient to prevent upward movement of and disengagement of the wafer from the chuck pins as the wafer is rotated during a wafer scrubbing and drying process. Each chuck pin may also present a wafer support surface of enhanced surface area for supporting the wafer on the chuck pin.

摘要翻译： 公开了一种用于卡盘辊的设计和用于晶片清洁和干燥系统的卡盘销的设计。 每个卡盘辊包括一个辊头，其确保晶片与卡盘辊的适当接合，以便在晶片洗涤过程期间旋转晶片。 每个卡盘销设置有延伸的凸缘或凸起，以防止在晶片洗涤和干燥过程中晶片旋转时，晶片与卡盘销向上移动和脱离接合。 每个卡盘销还可以呈现具有增强的表面积的晶片支撑表面，用于将晶片支撑在卡盘销上。