发明申请
- 专利标题: Electroplating reactor including back-side electrical contact apparatus
- 专利标题(中): 包括背面电接触装置的电镀反应器
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申请号: US10338200申请日: 2003-01-07
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公开(公告)号: US20040222086A1公开(公告)日: 2004-11-11
- 发明人: Daniel J. Woodruff , Kyle M. Hanson , Robert W. Batz JR. , James T. Kuechmann
- 主分类号: C25C007/00
- IPC分类号: C25C007/00 ; C25B009/00 ; C25F007/00 ; C25D017/04 ; C25D017/06 ; C25D017/16 ; B23H007/26 ; B23H011/00
摘要:
An apparatus for electroplating a workpiece is disclosed in which the apparatus includes a workpiece holding structure. The workpiece holding structure includes a workpiece support having at least one surface that is disposed to engage a front side of the workpiece and at least one electrical contact disposed for contact with at least one corresponding electrical contact on a back-side of the workpiece. The workpiece includes one or more electrically conductive paths between the at least one corresponding electrical contact and a front-side of the workpiece to facilitate electroplating of the front-side surface. An actuator is provided for driving the workpiece support between a first position in which the at least one electrical contact of the workpiece and the at least one contact of the workpiece holding structure are disengaged from one another, and a second position in which the at least one surface clamps the workpiece in a position in which the at least one electrical contact of the workpiece holding structure electrically engages the at least one electrical contact of the workpiece.
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