Invention Application
US20040227527A1 Method and relative test structure for measuring the coupling capacitance between two interconnect lines 有权
用于测量两条互连线之间的耦合电容的方法和相对测试结构

Method and relative test structure for measuring the coupling capacitance between two interconnect lines
Abstract:
A method and a relative test structure for measuring the coupling capacitance between two interconnect lines exploits the so-called cross-talk effect and keeps an interconnect line at a constant reference voltage. This approach addresses the problem of short-circuit currents that affect known test structures, and allows a direct measurement of the coupling capacitance between the two interconnect lines. Capacitance measurements may also be used for determining points of interruption of interconnect lines. When a line is interrupted, the measured coupling capacitance is the capacitance of a single conducting branch. The position of points of interruption of an interconnect line is determined by measuring the coupling capacitance of all segments of the line with a second conducting line.
Information query
Patent Agency Ranking
0/0