公开(公告)号：US20040227527A1

公开(公告)日：2004-11-18

申请号：US10836827

申请日：2004-04-30

Applicant: STMicroelectronics S.r.l.

Inventor： Luca Bortesi ,  Loris Vendrame ,  Alessandro Bogliolo

IPC: G01R027/26

CPC classification number: G01R27/2605 ,  G01R31/026 ,  G01R31/2853

Abstract: A method and a relative test structure for measuring the coupling capacitance between two interconnect lines exploits the so-called cross-talk effect and keeps an interconnect line at a constant reference voltage. This approach addresses the problem of short-circuit currents that affect known test structures, and allows a direct measurement of the coupling capacitance between the two interconnect lines. Capacitance measurements may also be used for determining points of interruption of interconnect lines. When a line is interrupted, the measured coupling capacitance is the capacitance of a single conducting branch. The position of points of interruption of an interconnect line is determined by measuring the coupling capacitance of all segments of the line with a second conducting line.

Abstract translation: 用于测量两个互连线之间的耦合电容的方法和相对测试结构利用所谓的串扰效应，并将互连线保持在恒定的参考电压。 这种方法解决了影响已知测试结构的短路电流的问题，并且允许直接测量两条互连线之间的耦合电容。 也可以使用电容测量来确定互连线的中断点。 当线路中断时，测量的耦合电容是单个导电支路的电容。 通过用第二导线测量线的所有段的耦合电容来确定互连线的中断点的位置。