Invention Application
US20040266308A1 Method to increase the emission current in FED displays through the surface modification of the emitters
审中-公开
通过发射体的表面改性来增加FED显示器中的发射电流的方法
- Patent Title: Method to increase the emission current in FED displays through the surface modification of the emitters
- Patent Title (中): 通过发射体的表面改性来增加FED显示器中的发射电流的方法
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Application No.: US10730041Application Date: 2003-12-09
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Publication No.: US20040266308A1Publication Date: 2004-12-30
- Inventor: Kanwal K. Raina
- Main IPC: B05D005/12
- IPC: B05D005/12 ; H01J009/04 ; H01J009/12
Abstract:
A system and method for fabricating a FED device is disclosed. The system and method provide for use of PECVD hydrogenation followed by nitrogen plasma treatment of the tip of the current emitter of the FED device. The use of this process greatly reduces the native oxides in the tip of the current emitter. Such native oxides function as undesirable insulators degrading current emission. By reducing the amount of oxides in the tip, this invention provides for an increase in the current emission of the FED device.
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