发明申请
- 专利标题： APPARATUS AND METHOD FOR FORMING ALIGNMENT LAYERS
- 专利标题（中）： 用于形成对准层的装置和方法
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申请号： US10604202申请日： 2003-07-01
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公开(公告)号： US20050001177A1公开(公告)日： 2005-01-06
- 发明人: Nobuo Okazaki , Yasuhiko Shiota , Johji Nakagaki
- 申请人： Nobuo Okazaki , Yasuhiko Shiota , Johji Nakagaki
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： G02F1/1337
- IPC分类号： G02F1/1337 ; G03C5/00 ; G03F9/00 ; G21G5/00 ; H01J37/08 ; H01J37/302 ; H01J37/317
摘要：
An object of the present invention is to provide an apparatus and method for ensuring a uniform orientation of liquid crystal molecules of an alignment layer by irradiation with ion beams. An apparatus of the present invention comprises a grid 11a having a plurality of ion ejection holes 30 of various sizes. The size of the ion ejection hole 30 varies depending on an ion density. The size of the ion ejection hole 30 increases with decrease in the ion density.
公开/授权文献
- US06849858B2 Apparatus and method for forming alignment layers 公开/授权日：2005-02-01