- 专利标题: Contact probe and probe device
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申请号: US10902859申请日: 2004-08-02
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公开(公告)号: US20050001641A1公开(公告)日: 2005-01-06
- 发明人: Hideaki Yoshida , Toshinori Ishii , Atushi Matsuda , Mituyoshi Ueki , Noriyoshi Tachikawa , Tadashi Nakamura , Naoki Kato , Shou Tai , Hayato Sasaki , Naohumi Iwamoto , Akihumi Mishima , Toshiharu Hiji , Akihiro Masuda
- 申请人: Hideaki Yoshida , Toshinori Ishii , Atushi Matsuda , Mituyoshi Ueki , Noriyoshi Tachikawa , Tadashi Nakamura , Naoki Kato , Shou Tai , Hayato Sasaki , Naohumi Iwamoto , Akihumi Mishima , Toshiharu Hiji , Akihiro Masuda
- 申请人地址: JP Chiyoda-ku
- 专利权人: Genesis Technology Incorporated
- 当前专利权人: Genesis Technology Incorporated
- 当前专利权人地址: JP Chiyoda-ku
- 优先权: JP8-128570 19960523; JP8-259829 19960930; JP8-259831 19960930; JP8-303322 19961114; JP8-306829 19961118; JP8-324430 19961204; JP8-349119 19961226
- 主分类号: G01R1/073
- IPC分类号: G01R1/073 ; G01R31/02
摘要:
A probe device having a contact probe including a film, a plurality of wiring patterns formed on the film with each wiring pattern having a front end portion projecting from the film so as to form contact pins, and a metal layer provided on the film. In one embodiment, the contact probe device includes first and second contact probes connected to each other, the first contact probe including a first film, and a plurality of first wiring patterns formed on the first film, each first wiring pattern having a front end portion projecting from the first film so as to form contact pins. The second contact probe includes a second film, and a plurality of second wiring patterns formed on the second film. The plurality of second wiring patterns are connected to the plurality of first wiring patterns, and the second contact probe is formed separately from the first contact probe.
公开/授权文献
- US06919732B2 Contact probe and probe device 公开/授权日:2005-07-19
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