发明申请
US20050002020A1 Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask
有权
具有两个传感器的检查装置，用于检查物体的方法和用于制造光刻掩模的方法
- 专利标题： Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask
- 专利标题（中）： 具有两个传感器的检查装置，用于检查物体的方法和用于制造光刻掩模的方法
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申请号： US10852434申请日： 2004-05-25
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公开(公告)号： US20050002020A1公开(公告)日： 2005-01-06
- 发明人: Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
- 申请人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
- 优先权： JPJP2003-149336 20030527
- 主分类号： G01N21/956
- IPC分类号： G01N21/956 ; G03F1/84 ; H01L21/66 ; G01N21/88
摘要：
A photolithography mask inspection apparatus has at least two sensors. One sensor is configured to sense light transmitted through an object to be inspected, and the other sensor senses light reflected off the object. A first optical system is arranged to expose a first portion of the object with a first light beam, and a second optical system is arranged to expose a second portion of the object, spaced form the first portion, with a second light beam. A third optical system focuses the transmitted light on to the first sensor, as well as the reflected light on to the second sensor. A defect detecting circuit is also provided to detect a defect of the object, based upon image data associated with the reflected and transmitted light.