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发明申请
US20050003218A1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing 有权
化学机械抛光止动膜，其制造方法和化学机械抛光方法

Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing
摘要：
A chemical mechanical polishing stopper film comprising at least one organic polymer, said film having a dielectric constant of 4 or lower, and a chemical mechanical polishing method. The chemical mechanical polishing method comprises forming a chemical mechanical polishing stopper film comprising at least one organic polymer on an insulating film so that the stopper film is interposed between the insulating film and a metal film to be removed by chemical mechanical polishing, and then removing the metal film with a chemical mechanical polishing slurry.
摘要（中）：

一种化学机械抛光阻挡膜，其包含至少一种有机聚合物，所述膜的介电常数为4或更低，以及化学机械抛光方法。 化学机械抛光方法包括在绝缘膜上形成包含至少一种有机聚合物的化学机械抛光阻挡膜，使得阻挡膜介于通过化学机械抛光除去的绝缘膜和金属膜之间，然后除去 金属薄膜与化学机械抛光浆料。

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