- 专利标题: Method of treating fluorine compound and treated substance
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申请号: US10809354申请日: 2004-03-26
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公开(公告)号: US20050004410A1公开(公告)日: 2005-01-06
- 发明人: Kiyoshi Fuda , Toshiaki Matsunaga , Takeshi Kamiya , Kota Omori
- 申请人: Kiyoshi Fuda , Toshiaki Matsunaga , Takeshi Kamiya , Kota Omori
- 申请人地址: JP Akita 010-8585
- 专利权人: JEMCO INC.
- 当前专利权人: JEMCO INC.
- 当前专利权人地址: JP Akita 010-8585
- 优先权: JP2000-227191 20000727; JP2001-206241 20010706
- 主分类号: C02F1/52
- IPC分类号: C02F1/52 ; C02F1/58 ; C02F1/66 ; C07C17/38 ; C07C51/47 ; C07C303/44
摘要:
Divalent and trivalent metal salts are added to the solution containing the fluorine compound to precipitate the layered double hydroxide containing the fluorine compound between layers. By these processes, the fluorine compound can be fixed with high rate. Moreover, if necessary, the precipitated layered double hydroxide can be recovered to separate the fluorine compound or its salt between layers. Therefore, the burden to environment or the ecosystem by the fluorine compound can be reduced.
公开/授权文献
- US07135430B2 Method of treating fluorine compounds and treated substance 公开/授权日:2006-11-14